RR

Ravi Rajagopalan

Applied Materials: 11 patents #1,198 of 7,310Top 20%
QU Qualcomm: 3 patents #4,487 of 12,104Top 40%
TG The Pride Group: 2 patents #1 of 3Top 35%
VA Varian Semiconductor Equipment Associates: 1 patents #304 of 513Top 60%
Overall (All Time): #253,839 of 4,157,543Top 7%
18
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
11061822 Method, apparatus, and system for reducing pipeline stalls due to address translation misses Pritha Ghoshal, Niket K. Choudhary, Patrick Eibl, Brian Michael Stempel, David Scott Ray +1 more 2021-07-13
10811257 Techniques for forming low stress etch-resistant mask using implantation Rajesh Prasad, Tzu-Yu Liu, Kyu-Ha Shim, Tom Ho Wing Yu, Zhong Qiang Hua +3 more 2020-10-20
9807946 Vertical living wall planter 2017-11-07
8499208 Method and apparatus for scheduling BIST routines James Norris Dieffenderfer, Anand Krishnamurthy, Clint Wayne Mumford, Jason Panavich, Ketan Vitthal Patel +1 more 2013-07-30
8443162 Methods and apparatus for dynamically managing banked memory Thomas Philip Speier, James Norris Dieffenderfer 2013-05-14
7745333 Methods for depositing tungsten layers employing atomic layer deposition techniques Ken Kaung Lai, Amit Khandelwal, Madhu Moorthy, Srinivas Gandikota, Joseph Castro +9 more 2010-06-29
7621075 Planter liner having an integral water tray 2009-11-24
7405158 Methods for depositing tungsten layers employing atomic layer deposition techniques Ken Kaung Lai, Amit Khandelwal, Madhu Moorthy, Srinivas Gandikota, Joseph Castro +9 more 2008-07-29
6789355 Planter having an integral water tray 2004-09-14
6677254 Processes for making a barrier between a dielectric and a conductor and products produced therefrom Pravin K. Narwankar, Mouloud Bakli, Randall S. Urdahl, Asher Sinensky, Shankarram Athreya 2004-01-13
6617266 Barium strontium titanate annealing process Annabel Nickles, Pravin K. Narwankar 2003-09-09
6548368 Method of forming a MIS capacitor Pravin K. Narwankar 2003-04-15
6274058 Remote plasma cleaning method for processing chambers Patricia M. Liu, Pravin K. Narwankar, Huyen Tran, Padmanabhan Krishnaraj, Alan Ablao +1 more 2001-08-14
6204174 Method for high rate deposition of tungsten Alexander D. Glew, Andrew David Johnson, Steve Ghanayem 2001-03-20
6174373 Non-plasma halogenated gas flow prevent metal residues Steve Ghanayem, Moris Kori, Maitreyee Mahajani 2001-01-16
6156382 Chemical vapor deposition process for depositing tungsten Steve Ghanayem, Manabu Yamazaki, Keiichi Ohtsuka, Yuji Maeda 2000-12-05
6070599 Non-plasma halogenated gas flow to prevent metal residues Steve Ghanayem, Moris Kori, Maitreyee Mahajani 2000-06-06
5709772 Non-plasma halogenated gas flow to prevent metal residues Steve Ghanayem, Moris Kori, Maitreyee Mahajani 1998-01-20