Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7846840 | Method for forming tungsten materials during vapor deposition processes | Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung | 2010-12-07 |
| 7709385 | Method for depositing tungsten-containing layers by vapor deposition techniques | Ming Xi, Ashok Sinha, Alfred Mak, Xinliang Lu, Ken Kaung Lai +1 more | 2010-05-04 |
| 7674715 | Method for forming tungsten materials during vapor deposition processes | Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more | 2010-03-09 |
| 7605083 | Formation of composite tungsten films | Ken Kaung Lai, Jeong Soo Byun, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos +7 more | 2009-10-20 |
| 7465665 | Method for depositing tungsten-containing layers by vapor deposition techniques | Ming Xi, Ashok Sinha, Alfred Mak, Xinliang Lu, Ken Kaung Lai +1 more | 2008-12-16 |
| 7465666 | Method for forming tungsten materials during vapor deposition processes | Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more | 2008-12-16 |
| 7384867 | Formation of composite tungsten films | Ken Kaung Lai, Jeong Soo Byun, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos +7 more | 2008-06-10 |
| 7235486 | Method for forming tungsten materials during vapor deposition processes | Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more | 2007-06-26 |
| 7220673 | Method for depositing tungsten-containing layers by vapor deposition techniques | Ming Xi, Ashok Sinha, Alfred Mak, Xinliang Lu, Ken Kaung Lai +1 more | 2007-05-22 |
| 7115494 | Method and system for controlling the presence of fluorine in refractory metal layers | Ashok Sinha, Ming Xi, Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei +1 more | 2006-10-03 |
| 7101795 | Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer | Ming Xi, Ashok Sinha, Alfred Mak, Xinliang Lu, Ken Kaung Lai +1 more | 2006-09-05 |
| 7033922 | Method and system for controlling the presence of fluorine in refractory metal layers | Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more | 2006-04-25 |
| 6939804 | Formation of composite tungsten films | Ken Kaung Lai, Jeong Soo Byun, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos +7 more | 2005-09-06 |
| 6855368 | Method and system for controlling the presence of fluorine in refractory metal layers | Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung | 2005-02-15 |
| 6849545 | System and method to form a composite film stack utilizing sequential deposition techniques | Alfred Mak, Mei Chang, Jeong Soo Byun, Hua Chung, Ashok Sinha | 2005-02-01 |
| 6729824 | Dual robot processing system | Lawrence Chung-Lai Lei | 2004-05-04 |
| 6551929 | Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques | Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more | 2003-04-22 |
| 6174373 | Non-plasma halogenated gas flow prevent metal residues | Steve Ghanayem, Maitreyee Mahajani, Ravi Rajagopalan | 2001-01-16 |
| 6070599 | Non-plasma halogenated gas flow to prevent metal residues | Steve Ghanayem, Maitreyee Mahajani, Ravi Rajagopalan | 2000-06-06 |
| 6040011 | Substrate support member with a purge gas channel and pumping system | Joseph Yudovsky | 2000-03-21 |
| 5709772 | Non-plasma halogenated gas flow to prevent metal residues | Steve Ghanayem, Maitreyee Mahajani, Ravi Rajagopalan | 1998-01-20 |