| 7846840 |
Method for forming tungsten materials during vapor deposition processes |
Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung |
2010-12-07 |
| 7709385 |
Method for depositing tungsten-containing layers by vapor deposition techniques |
Ming Xi, Ashok Sinha, Alfred Mak, Xinliang Lu, Ken Kaung Lai +1 more |
2010-05-04 |
| 7674715 |
Method for forming tungsten materials during vapor deposition processes |
Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more |
2010-03-09 |
| 7605083 |
Formation of composite tungsten films |
Ken Kaung Lai, Jeong Soo Byun, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos +7 more |
2009-10-20 |
| 7465665 |
Method for depositing tungsten-containing layers by vapor deposition techniques |
Ming Xi, Ashok Sinha, Alfred Mak, Xinliang Lu, Ken Kaung Lai +1 more |
2008-12-16 |
| 7465666 |
Method for forming tungsten materials during vapor deposition processes |
Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more |
2008-12-16 |
| 7384867 |
Formation of composite tungsten films |
Ken Kaung Lai, Jeong Soo Byun, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos +7 more |
2008-06-10 |
| 7235486 |
Method for forming tungsten materials during vapor deposition processes |
Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more |
2007-06-26 |
| 7220673 |
Method for depositing tungsten-containing layers by vapor deposition techniques |
Ming Xi, Ashok Sinha, Alfred Mak, Xinliang Lu, Ken Kaung Lai +1 more |
2007-05-22 |
| 7115494 |
Method and system for controlling the presence of fluorine in refractory metal layers |
Ashok Sinha, Ming Xi, Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei +1 more |
2006-10-03 |
| 7101795 |
Method and apparatus for depositing refractory metal layers employing sequential deposition techniques to form a nucleation layer |
Ming Xi, Ashok Sinha, Alfred Mak, Xinliang Lu, Ken Kaung Lai +1 more |
2006-09-05 |
| 7033922 |
Method and system for controlling the presence of fluorine in refractory metal layers |
Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more |
2006-04-25 |
| 6939804 |
Formation of composite tungsten films |
Ken Kaung Lai, Jeong Soo Byun, Frederick Wu, Ramanujapuran A. Srinivas, Avgerinos V. Gelatos +7 more |
2005-09-06 |
| 6855368 |
Method and system for controlling the presence of fluorine in refractory metal layers |
Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung |
2005-02-15 |
| 6849545 |
System and method to form a composite film stack utilizing sequential deposition techniques |
Alfred Mak, Mei Chang, Jeong Soo Byun, Hua Chung, Ashok Sinha |
2005-02-01 |
| 6729824 |
Dual robot processing system |
Lawrence Chung-Lai Lei |
2004-05-04 |
| 6551929 |
Bifurcated deposition process for depositing refractory metal layers employing atomic layer deposition and chemical vapor deposition techniques |
Alfred Mak, Jeong Soo Byun, Lawrence Chung-Lai Lei, Hua Chung, Ashok Sinha +1 more |
2003-04-22 |
| 6174373 |
Non-plasma halogenated gas flow prevent metal residues |
Steve Ghanayem, Maitreyee Mahajani, Ravi Rajagopalan |
2001-01-16 |
| 6070599 |
Non-plasma halogenated gas flow to prevent metal residues |
Steve Ghanayem, Maitreyee Mahajani, Ravi Rajagopalan |
2000-06-06 |
| 6040011 |
Substrate support member with a purge gas channel and pumping system |
Joseph Yudovsky |
2000-03-21 |
| 5709772 |
Non-plasma halogenated gas flow to prevent metal residues |
Steve Ghanayem, Maitreyee Mahajani, Ravi Rajagopalan |
1998-01-20 |
