SG

Steve Ghanayem

Applied Materials: 36 patents #282 of 7,310Top 4%
Overall (All Time): #92,888 of 4,157,543Top 3%
36
Patents All Time

Issued Patents All Time

Showing 25 most recent of 36 patents

Patent #TitleCo-InventorsDate
11887855 Methods for depositing fluorine/carbon-free conformal tungsten Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, Mei Chang +1 more 2024-01-30
10985023 Methods for depositing fluorine/carbon-free conformal tungsten Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, Mei Chang +1 more 2021-04-20
10429747 Hybrid laser and implant treatment for overlay error correction Mangesh Ashok BANGAR, Srinivas D. Nemani, Ellie Yieh 2019-10-01
9601339 Methods for depositing fluorine/carbon-free conformal tungsten Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, Mei Chang +1 more 2017-03-21
9230815 Methods for depositing fluorine/carbon-free conformal tungsten Xinyu Fu, Srinivas Gandikota, Avgerinos V. Gelatos, Atif Noori, Mei Chang +1 more 2016-01-05
7774887 Scrubber box and methods for using the same Joseph Yudovsky, Avi Tepman, Kenneth R. Reynolds, Younes Achkire, Dan Marohl +4 more 2010-08-17
7745309 Methods for surface activation by plasma immersion ion implantation process utilized in silicon-on-insulator structure Randhir P. S. Thakur, Stephen Moffatt, Per-Ove Hansson 2010-06-29
7601652 Method for treating substrates and films with photoexcitation Kaushal K. Singh, Sean M. Seutter, Jacob Smith, R. Suryanarayanan Iyer, Adam Brailove +2 more 2009-10-13
7377002 Scrubber box Joseph Yudovsky, Avi Tepman, Kenneth R. Reynolds, Younes Achkire, Dan Marohl +4 more 2008-05-27
7192486 Clog-resistant gas delivery system Won Bae Bang, Yen-Kun Wang 2007-03-20
6677247 Method of increasing the etch selectivity of a contact sidewall to a preclean etchant Zheng Yuan, Randhir P. S. Thakur 2004-01-13
6638810 Tantalum nitride CVD deposition by tantalum oxide densification Mouloud Bakli, Huyen Tran 2003-10-28
6602770 Silicon layer to improve plug filling by CVD Sandeep Desai, Scott Brad Herner 2003-08-05
6464795 Substrate support member for a processing chamber Semyon Sherstinsky, Calvin Augason, Leonel A. Zuniga, Jun Zhao, Talex Sajoto +5 more 2002-10-15
6328808 Apparatus and method for aligning and controlling edge deposition on a substrate Kenneth Tsai, Joseph Yudovsky, Ken Kaung Lai, Patricia M. Liu, Toshiyuki Nakagawa +1 more 2001-12-11
6319766 Method of tantalum nitride deposition by tantalum oxide densification Mouloud Bakli, Huyen Tran 2001-11-20
6309713 Deposition of tungsten nitride by plasma enhanced chemical vapor deposition Alfred Mak, Ling Chen, David Charles Smith, Mei Chang 2001-10-30
6303480 Silicon layer to improve plug filling by CVD Sandeep Desai, Scott Brad Herner 2001-10-16
6271129 Method for forming a gap filling refractory metal layer having reduced stress Maitreyee Mahajani 2001-08-07
6251190 Gate electrode connection structure by in situ chemical vapor deposition of tungsten and tungsten nitride Alfred Mak, Kevin Lai, Cissy Leung, Thomas Wendling, Ping Jian 2001-06-26
6248176 Apparatus and method for delivering a gas Joseph Yudovsky, Kenneth Tsai, Semyon Sherstinsky 2001-06-19
6210483 Anti-notch thinning heater Ken Tsai, Joseph Yudovsky, Ken Kaung Lai 2001-04-03
6204174 Method for high rate deposition of tungsten Alexander D. Glew, Andrew David Johnson, Ravi Rajagopalan 2001-03-20
6192601 Method and apparatus for reducing particle contamination during wafer transport Madhavi R. Chandrachood 2001-02-27
6186092 Apparatus and method for aligning and controlling edge deposition on a substrate Kenneth Tsai, Joseph Yudovsky, Ken Kaung Lai, Patricia M. Liu, Toshiyuki Nakagawa +1 more 2001-02-13