Issued Patents All Time
Showing 26–36 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6174373 | Non-plasma halogenated gas flow prevent metal residues | Moris Kori, Maitreyee Mahajani, Ravi Rajagopalan | 2001-01-16 |
| 6162715 | Method of forming gate electrode connection structure by in situ chemical vapor deposition of tungsten and tungsten nitride | Alfred Mak, Kevin Lai, Cissy Leung, Thomas Wendling, Ping Jian | 2000-12-19 |
| 6156382 | Chemical vapor deposition process for depositing tungsten | Ravi Rajagopalan, Manabu Yamazaki, Keiichi Ohtsuka, Yuji Maeda | 2000-12-05 |
| 6106634 | Methods and apparatus for reducing particle contamination during wafer transport | Madhavi R. Chandrachood | 2000-08-22 |
| 6070599 | Non-plasma halogenated gas flow to prevent metal residues | Moris Kori, Maitreyee Mahajani, Ravi Rajagopalan | 2000-06-06 |
| 5985033 | Apparatus and method for delivering a gas | Joseph Yudovsky, Kenneth Tsai, Semyon Sherstinsky | 1999-11-16 |
| 5777245 | Particle dispersing system and method for testing semiconductor manufacturing equipment | Madhavi R. Chandrachood, Nancy Cantwell, Daniel J. Rader, Anthony S. Geller | 1998-07-07 |
| 5709772 | Non-plasma halogenated gas flow to prevent metal residues | Moris Kori, Maitreyee Mahajani, Ravi Rajagopalan | 1998-01-20 |
| 5552016 | Method and apparatus for etchback endpoint detection | — | 1996-09-03 |
| 5328722 | Metal chemical vapor deposition process using a shadow ring | Virendra V. Rana | 1994-07-12 |
| 5292554 | Deposition apparatus using a perforated pumping plate | Ashok Sinha, Virendra V. Rana | 1994-03-08 |