Issued Patents All Time
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6797108 | Apparatus and method for evenly flowing processing gas onto a semiconductor wafer | — | 2004-09-28 |
| 6251190 | Gate electrode connection structure by in situ chemical vapor deposition of tungsten and tungsten nitride | Alfred Mak, Kevin Lai, Cissy Leung, Steve Ghanayem, Ping Jian | 2001-06-26 |
| 6162715 | Method of forming gate electrode connection structure by in situ chemical vapor deposition of tungsten and tungsten nitride | Alfred Mak, Kevin Lai, Cissy Leung, Steve Ghanayem, Ping Jian | 2000-12-19 |