{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method for metal deposition using hydrogen plasma", "item": "https://www.patentleaderboard.com/patent/8637410"}]}
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Home › Method for metal deposition using hydrogen plasma

Method for metal deposition using hydrogen plasma

US Patent 8637410 · Granted Jan 28, 2014

Estimated economic value: $15,652,000 ⓘ

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