{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method and apparatus for removing processing liquid from a processing liquid delivery line", "item": "https://www.patentleaderboard.com/patent/6305392"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for removing processing liquid from a processing liquid delivery line

Method and apparatus for removing processing liquid from a processing liquid delivery line

US Patent 6305392 · Granted Oct 23, 2001

Estimated economic value: $163,024,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate support for a substrate processing chamber2025
Integrated epitaxy and preclean system2024
Reducing substrate surface scratching using machine learning2023
Wafer treatment for achieving defect-free self-assembled monolayers2023
Reducing substrate surface scratching using machine learning2023
Methods for enhancing selectivity in SAM-based selective deposition2022
Integrated CMOS source drain formation with advanced control2022
Method of fabricating a semiconductor device having reduced contact resistance2021
Integrated epitaxy and preclean system2021
Epitaxy system integrated with high selectivity oxide removal and high temperatu2021
Methods and apparatus for cryogenic gas stream assisted SAM-based selective depo2021
Methods for enhancing selectivity in SAM-based selective deposition2021