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Method of recycling useful metal |
Tomoyuki Ubusawa, Tomoyuki Furuyama, Akihiro Morikaku, Kumpei Tanaka |
2012-11-27 |
| 6054383 |
Fabrication method of semiconductor device |
Mieko Suzuki |
2000-04-25 |
| 5939771 |
Semiconductor device having an organic resin layer and silicon oxide layer containing fluorine for preventing crosstalk between metal lines and a method of manufacturing the same |
Tatsuya Usami |
1999-08-17 |
| 5891234 |
Spin on glass material and method for forming a semiconductor device by using improved spin on glass material |
Kenichi Koyanagi, Koji Kishimoto |
1999-04-06 |
| 5840631 |
Method of manufacturing semiconductor device |
Akira Kubo, Koji Kishimoto |
1998-11-24 |
| 5776829 |
Method for forming multilevel interconnections in a semiconductor device |
Makoto Sekine |
1998-07-07 |
| 5744378 |
Method for fabricating a semiconductor device having multilevel interconnections |
— |
1998-04-28 |
| 5607880 |
Method of fabricating multilevel interconnections in a semiconductor integrated circuit |
Mieko Suzuki |
1997-03-04 |
| 5521424 |
Semiconductor device having a silicon oxide film containing fluorine atoms |
Kazuyoshi Ueno |
1996-05-28 |
| 5506177 |
Fabrication process for multilevel interconnections in a semiconductor device |
Koji Kishimoto |
1996-04-09 |
| 5491108 |
Method of producing semiconductor integrated circuit device having interplayer insulating film covering substrate |
Mieko Suzuki, Yukinobu Murao, Takaho Tanigawa, Hiroki Koga |
1996-02-13 |
| 5468682 |
Method of manufacturing semiconductor device using the abrasive |
— |
1995-11-21 |
| 5444023 |
Method of fabricating a semiconductor device having a multilayer wiring structure and using a fluorine compound-containing gas |
— |
1995-08-22 |
| 5420075 |
Forming multi-layered interconnections with fluorine compound treatment permitting selective deposition of insulator |
Mieko Suzuki |
1995-05-30 |
| 5407529 |
Method for manufacturing semiconductor device |
— |
1995-04-18 |
| 5405805 |
Method for forming interconnect structure, insulating films and surface protective films of semiconductor device |
— |
1995-04-11 |
| 5399529 |
Process for producing semiconductor devices |
— |
1995-03-21 |
| 5334552 |
Method for fabricating a semiconductor device having a multi-layered interconnection structure |
— |
1994-08-02 |
| 5288518 |
Chemical vapor deposition method for forming fluorine containing silicon oxide film |
— |
1994-02-22 |
| 5215787 |
Method of forming silicon oxide film containing fluorine |
— |
1993-06-01 |