YT

Yoshitaka Tsunashima

KT Kabushiki Kaisha Toshiba: 78 patents #142 of 21,451Top 1%
TL Tokyo Electron Limited: 1 patents #3,538 of 5,567Top 65%
📍 Yokohama, NY: #9 of 63 inventorsTop 15%
Overall (All Time): #23,339 of 4,157,543Top 1%
79
Patents All Time

Issued Patents All Time

Showing 1–25 of 79 patents

Patent #TitleCo-InventorsDate
RE46122 Semiconductor device and method of manufacturing the same Masayuki Tanaka, Shigehiko Saida 2016-08-23
9293563 Semiconductor memory device and method of manufacturing the same Tetsuya Kai, Yoshio Ozawa, Ryota Fujitsuka 2016-03-22
8796757 Semiconductor memory device and method of manufacturing the same Tetsuya Kai, Yoshio Ozawa, Ryota Fujitsuka 2014-08-05
7972960 Method for manufacturing thin film Kyoichi Suguro 2011-07-05
7947610 Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof Seiji Inumiya, Yasumasa Suizu, Yoshio Ozawa, Kiyotaka Miyano, Masayuki Tanaka 2011-05-24
7879658 Semiconductor device and method for manufacturing the same Yoshio Ozawa, Ichiro Mizushima, Takashi Suzuki, Hirokazu Ishida 2011-02-01
7858536 Semiconductor device and method for manufacturing semiconductor device Kazuhiro Eguchi, Seiji Inumiya 2010-12-28
7772076 Method of manufacturing semiconductor device using dummy gate wiring layer Atsushi Yagishita, Kouji Matsuo, Yasushi Akasaka, Kyoichi Suguro 2010-08-10
7772671 Semiconductor device having an element isolating insulating film Kyoichi Suguro, Kiyotaka Miyano, Ichiro Mizushima, Takayuki Hiraoka, Yasushi Akasaka +1 more 2010-08-10
7618876 Semiconductor device and method of manufacturing the same by filling a trench which includes an additional coating step Osamu Arisumi, Masahiro Kiyotoshi, Katsuhiko Hieda 2009-11-17
7544593 Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof Seiji Ihumiya, Yasumasa Suizu, Yoshio Ozawa, Kiyotaka Miyano, Masayuki Tanaka 2009-06-09
7507634 Method for fabricating a localize SOI in bulk silicon substrate including changing first trenches formed in the substrate into unclosed empty space by applying heat treatment Tsutomu Sato, Mie Matsuo, Ichiro Mizushima, Shinichi Takagi 2009-03-24
7501335 Semiconductor device and manufacturing method of the same Katsuyuki Sekine, Seiji Inumiya, Akio Kaneko, Motoyuki Sato, Kazuhiro Eguchi 2009-03-10
7425480 Semiconductor device and method of manufacture thereof Yoshio Ozawa, Yasumasa Suizu 2008-09-16
7372113 Semiconductor device and method of manufacturing the same Masayuki Tanaka, Yoshio Ozawa, Shigehiko Saida, Akira Goda, Mitsuhiro Noguchi +1 more 2008-05-13
7361960 Semiconductor device and method of manufacturing the same Kiyotaka Miyano, Yukihiro Ushiku 2008-04-22
7312138 Semiconductor device and method of manufacture thereof Yoshio Ozawa, Yasumasa Suizu 2007-12-25
7306994 Semiconductor device having a gate insulating film structure including an insulating film containing metal, silicon and oxygen and manufacturing method thereof Seiji Inumiya, Yasumasa Suizu, Yoshio Ozawa, Kiyotaka Miyano, Masayuki Tanaka 2007-12-11
7303946 Method of manufacturing a semiconductor device using an oxidation process Yoshio Ozawa, Yasumasa Suizu 2007-12-04
7282774 Semiconductor device and method for manufacturing semiconductor device Kazuhiro Eguchi, Seiji Inumiya 2007-10-16
7235456 Method of making empty space in silicon Tsutomu Sato, Mie Matsuo, Ichiro Mizushima, Shinichi Takagi 2007-06-26
7208797 Semiconductor device Atsushi Yagishita, Kouji Matsuo, Yasushi Akasaka, Kyoichi Suguro 2007-04-24
7145667 Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, semiconductor device manufacturing system, and cleaning method for semiconductor device manufacturing apparatus Akihito Yamamoto, Takashi Nakao, Yuuichi Mikata 2006-12-05
7129132 Semiconductor device and method of manufacturing the same Masayuki Tanaka, Shigehiko Saida 2006-10-31
7101775 Semiconductor device and method for manufacturing semiconductor device Kazuhiro Eguchi, Seiji Inumiya 2006-09-05