Issued Patents All Time
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| RE46122 | Semiconductor device and method of manufacturing the same | Masayuki Tanaka, Yoshitaka Tsunashima | 2016-08-23 |
| 7612401 | Non-volatile memory cell | Yoshio Ozawa, Yuji Takeuchi, Masanobu Saito | 2009-11-03 |
| 7541233 | Semiconductor device and method of manufacturing the same | Yoshio Ozawa, Yuji Takeuchi, Masanobu Saito | 2009-06-02 |
| 7372113 | Semiconductor device and method of manufacturing the same | Masayuki Tanaka, Yoshio Ozawa, Akira Goda, Mitsuhiro Noguchi, Yuichiro Mitani +1 more | 2008-05-13 |
| 7148158 | Semiconductor device and method for manufacturing the same | Yoshio Ozawa, Masayuki Tanaka, Kiyotaka Miyano | 2006-12-12 |
| 7129132 | Semiconductor device and method of manufacturing the same | Masayuki Tanaka, Yoshitaka Tsunashima | 2006-10-31 |
| 7098115 | Semiconductor device and method of manufacturing the same | Masayuki Tanaka, Yoshitaka Tsunashima | 2006-08-29 |
| 7081386 | Semiconductor device and method of manufactuing the same | Yoshio Ozawa, Yuji Takeuchi, Masanobu Saito | 2006-07-25 |
| 7060555 | Semiconductor device and method of manufacturing the same | Masayuki Tanaka, Yoshitaka Tsunashima | 2006-06-13 |
| 6992020 | Method of fabricating semiconductor device | Susumu Hiyama, Akihito Yamamoto, Hiroshi Akahori | 2006-01-31 |
| 6903422 | Semiconductor integrated circuits, fabrication method for the same and semiconductor integrated circuit systems | Akira Goda, Mitsuhiro Noguchi, Masayuki Tanaka | 2005-06-07 |
| 6841850 | Semiconductor device having silicon nitride film and silicon oxide film, and method of fabricating the same | Susumu Hiyama, Akihito Yamamoto, Hiroshi Akahori | 2005-01-11 |
| 6794713 | Semiconductor device and method of manufacturing the same including a dual layer raised source and drain | Ichiro Mizushima, Takeo Furuhata, Yoshitaka Tsunashima | 2004-09-21 |
| 6790723 | Semiconductor device and method of manufacturing the same | Masayuki Tanaka, Yoshitaka Tsunashima | 2004-09-14 |
| 6774462 | Semiconductor device comprising dual silicon nitride layers with varying nitrogen ratio | Masayuki Tanaka, Yoshio Ozawa, Akira Goda, Mitsuhiro Noguchi, Yuichiro Mitani +1 more | 2004-08-10 |
| 6772045 | System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor device | Shuji Katsui, Masayuki Tanaka, Masaki Kamimura, Hiroshi Akahori, Ichiro Mizushima +4 more | 2004-08-03 |
| 6713359 | Semiconductor device and method of manufacturing the same including raised source/drain comprising SiGe or SiC | Ichiro Mizushima, Takeo Furuhata, Yoshitaka Tsunashima | 2004-03-30 |
| 6538271 | Semiconductor device and method of manufacturing the same | Yoshitaka Tsunashima | 2003-03-25 |
| 6333547 | Semiconductor device and method of manufacturing the same | Masayuki Tanaka, Yoshitaka Tsunashima | 2001-12-25 |
| 6326658 | Semiconductor device including an interface layer containing chlorine | Yoshitaka Tsunashima, Katsuya Okumura, Masayuki Tanaka, Hirofumi Inoue, Takeshi Hamamoto | 2001-12-04 |
| 6284583 | Semiconductor device and method of manufacturing the same | Yoshitaka Tsunashima | 2001-09-04 |
| 6146938 | Method of fabricating semiconductor device | Yoshitaka Tsunashima, Tsutomu Sato | 2000-11-14 |
| 5949102 | Semiconductor device having a gate electrode with only two crystal grains | Yoshio Ozawa | 1999-09-07 |
| 5869858 | Semiconductor device for reducing variations in characteristics of the device | Yoshio Ozawa | 1999-02-09 |
| 5866930 | Semiconductor device and method of manufacturing the same | Yoshio Ozawa | 1999-02-02 |