YM

Yuuichi Mikata

KT Kabushiki Kaisha Toshiba: 43 patents #442 of 21,451Top 3%
TL Tokyo Electron Limited: 4 patents #1,723 of 5,567Top 35%
EB Ebara: 2 patents #752 of 1,611Top 50%
Rohm Co.: 1 patents #1,438 of 2,292Top 65%
SC Sanyo Electric Co.: 1 patents #3,644 of 6,347Top 60%
TS Tokyo Electron Sagami: 1 patents #39 of 81Top 50%
Overall (All Time): #63,526 of 4,157,543Top 2%
46
Patents All Time

Issued Patents All Time

Showing 1–25 of 46 patents

Patent #TitleCo-InventorsDate
7844433 System, method and program for designing a utility facility and method for manufacturing a product by the utility facility Toshikatsu Masuda, Toshinori Shinki, Shuichi Samata 2010-11-30
7632382 Plating apparatus Koji Saito, Katsumi Sameshima 2009-12-15
7497908 Film coating unit and film coating method Tsuyoshi Mizuno, Kimihide Saito 2009-03-03
7145667 Semiconductor device manufacturing method, semiconductor device manufacturing apparatus, semiconductor device manufacturing system, and cleaning method for semiconductor device manufacturing apparatus Akihito Yamamoto, Takashi Nakao, Yoshitaka Tsunashima 2006-12-05
6989281 Cleaning method for a semiconductor device manufacturing apparatus Akihito Yamamoto, Takashi Nakao, Yoshitaka Tsunashima 2006-01-24
6983191 Semiconductor manufacturing line availability evaluating system and design system 2006-01-03
6944572 Apparatus for predicting life of rotary machine and equipment using the same Yukihiro Ushiku, Tsunetoshi Arikado, Shuichi Samata, Takashi Nakao 2005-09-13
6929991 Reliable semiconductor device and method of manufacturing the same Shuji Katsui, Hiroshi Akahori 2005-08-16
6867054 Method of manufacturing a semiconductor device 2005-03-15
6865513 Method for predicting life of rotary machine and determining repair timing of rotary machine Yukihiro Ushiku, Tsunetoshi Arikado, Shuichi Samata, Takashi Nakao 2005-03-08
6772045 System for determining dry cleaning timing, method for determining dry cleaning timing, dry cleaning method, and method for manufacturing semiconductor device Shuji Katsui, Masayuki Tanaka, Masaki Kamimura, Hiroshi Akahori, Ichiro Mizushima +4 more 2004-08-03
6713824 Reliable semiconductor device and method of manufacturing the same Shuji Katsui, Hiroshi Akahori 2004-03-30
6329303 Thin film forming method, thin film forming apparatus and method for manufacturing semiconductor device 2001-12-11
6171977 Semiconductor device applied to composite insulative film manufacturing method thereof Yoshio Kasai, Takashi Suzuki, Takanori Tsuda, Hiroshi Akahori, Akihito Yamamoto 2001-01-09
6163050 Semiconductor device having insulation film whose breakdown voltage is improved and its manufacturing method Kiyoshi Hisatomi, Sakae Funo, Katsunori Ishihara 2000-12-19
6093243 Semiconductor device and its fabricating method Takako Okada, Shigeru Kambayashi, Moto Yabuki, Shinji Onga, Yoshitaka Tsunashima +1 more 2000-07-25
6066872 Semiconductor device and its fabricating method Takako Okada, Shigeru Kambayashi, Moto Yabuki, Shinji Onga, Yoshitaka Tsunashima +1 more 2000-05-23
5879447 Semiconductor device and its fabricating method Takako Okada, Shigeru Kambayashi, Moto Yabuki, Shinji Onga, Yoshitaka Tsunashima +1 more 1999-03-09
5838056 Semiconductor device applied to composite insulative film and manufacturing method thereof Yoshio Kasai, Takashi Suzuki, Takanori Tsuda, Hiroshi Akahori, Akihito Yamamoto 1998-11-17
5766785 Method and apparatus for manufacturing a semiconductor device Takashi Nakao, Yoshitaka Tsunashima 1998-06-16
5746581 Method and apparatus for evacuating vacuum system Katsuya Okumura, Manabu Tsujimura, Yoshio Ando 1998-05-05
5714399 Semiconductor device having insulation film whose breakdown voltage is improved and its manufacturing method Kiyoshi Hisatomi, Sakae Funo, Katsunori Ishihara 1998-02-03
5702531 Apparatus for forming a thin film 1997-12-30
5702529 Method of making doped semiconductor film having uniform impurity concentration on semiconductor substrate and apparatus for making the same Katsunori Ishihara, Katsuya Okumura 1997-12-30
5637153 Method of cleaning reaction tube and exhaustion piping system in heat processing apparatus Reiji Niino, Yoshiyuki Fujita, Hideki Lee, Yasuo Imamura, Toshiharu Nishimura +4 more 1997-06-10