Issued Patents All Time
Showing 26–46 of 46 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5612236 | Method of forming a silicon semiconductor device using doping during deposition of polysilicon | Toshiro Usami, Katsunori Ishihara | 1997-03-18 |
| 5582640 | Semiconductor device and its fabricating method | Takako Okada, Shigeru Kambayashi, Moto Yabuki, Shinji Onga, Yoshitaka Tsunashima +1 more | 1996-12-10 |
| 5561087 | Method of forming a uniform thin film by cooling wafers during CVD | — | 1996-10-01 |
| 5380370 | Method of cleaning reaction tube | Reiji Niino, Yoshiyuki Fujita, Hideki Lee, Yasuo Imamura, Toshiharu Nishimura +3 more | 1995-01-10 |
| 5378652 | Method of making a through hole in multi-layer insulating films | Shuichi Samata, Toshiro Usami | 1995-01-03 |
| 5370371 | Heat treatment apparatus | Katsushin Miyagi, Shingo Watanabe, Katsuya Okumura | 1994-12-06 |
| 5316472 | Vertical boat used for heat treatment of semiconductor wafer and vertical heat treatment apparatus | Reiji Niino, Isao Siratani, Yutaka Simada, Hiroki Fukusima, Hirofumi Kitayama +1 more | 1994-05-31 |
| 5291058 | Semiconductor device silicon via fill formed in multiple dielectric layers | Shuichi Samata, Toshiro Usami | 1994-03-01 |
| 5286523 | Method of processing substrates and substrate processing apparatus | Tetsuo Matsuda, Akimichi Yonekura | 1994-02-15 |
| 5250463 | Method of making doped semiconductor film having uniform impurity concentration on semiconductor substrate | Katsunori Ishihara, Katsuya Okumura | 1993-10-05 |
| 5238859 | Method of manufacturing semiconductor device | Hiroyuki Kamijo, Toshiro Usami | 1993-08-24 |
| 5237196 | Semiconductor device and method for manufacturing the same | Katsunori Ishihara | 1993-08-17 |
| 5234869 | Method of manufacturing silicon nitride film | Takahiko Moriya | 1993-08-10 |
| 5181088 | Vertical field effect transistor with an extended polysilicon channel region | Toshiro Usami | 1993-01-19 |
| 5149666 | Method of manufacturing a semiconductor memory device having a floating gate electrode composed of 2-10 silicon grains | Toshiro Usami | 1992-09-22 |
| 5032535 | Method of manufacturing semiconductor device | Hiroyuki Kamijo, Toshiro Usami | 1991-07-16 |
| 5031010 | Semiconductor memory device and method of manufacturing the same | Toshiro Usami | 1991-07-09 |
| 4966866 | Method for manufacturing semiconductor device having gate electrodes of different conductivity types | Shuichi Samata | 1990-10-30 |
| 4931405 | Method for manufacturing a semiconductor device and suppressing the generation of bulk microdefects near the substrate surface layer | Hiroyuki Kamijo | 1990-06-05 |
| 4721991 | Refractory silicide conductor containing iron | Reiji Ohtaki, Masanobu Ogino | 1988-01-26 |
| 4597159 | Method of manufacturing SiO.sub.2 -Si interface for floating gate semiconductor device | Toshiro Usami, Kazuyoshi Shinada | 1986-07-01 |