Issued Patents All Time
Showing 1–25 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12322617 | Dual zone heaters for metallic pedestals | Sairam Sundaram, Aaron Durbin | 2025-06-03 |
| 12308264 | Rapid tuning of critical dimension non-uniformity by modulating temperature transients of multi-zone substrate supports | Ravi Kumar, Pulkit Agarwal, Adrien LaVoie, Michael Philip Roberts | 2025-05-20 |
| 12266509 | Multilayer coatings of component parts for a work piece processing chamber | Paul Konkola, Andrew H. Breninger, Tony Kaushal | 2025-04-01 |
| 12209312 | Temperature control of a multi-zone pedestal | Michael Philip Roberts, Aaron Bingham, Ashish Saurabh, Adrien LaVoie, Pulkit Agarwal +1 more | 2025-01-28 |
| 12209310 | Concentration control using a bubbler | Easwar Srinivasan, Erica Sakura Strandberg Pohl, Andrew Borth, Aleksey V. Altecor | 2025-01-28 |
| 12186851 | Use of vacuum during transfer of substrates | Michael Philip Roberts, Paul Konkola, Michael G. R. Smith, Brian Joseph Williams, Ravi Kumar +2 more | 2025-01-07 |
| 12142509 | Electrostatic chuck with seal surface | Patrick Breiling, Michael Philip Roberts, Chloe Baldasseroni, Ishtak Karim, Adrien LaVoie | 2024-11-12 |
| 12110586 | Pedestals for modulating film properties in atomic layer deposition (ALD) substrate processing chambers | Adrien LaVoie, Michael Philip Roberts, Chloe Baldasseroni, Richard Phillips | 2024-10-08 |
| 12071689 | Trim and deposition profile control with multi-zone heated substrate support for multi-patterning processes | Michael Philip Roberts, Pulkit Agarwal, Adrien LaVoie, Ravi Kumar, Nuoya Yang +2 more | 2024-08-27 |
| 12062554 | Progressive heating of components of substrate processing systems using TCR element-based heaters | Easwar Srinivasan | 2024-08-13 |
| 12049698 | Systems and methods for reducing effluent build-up in a pumping exhaust system | Antonio Xavier, Steven Goza, Adrien LaVoie, Joseph Nesmith | 2024-07-30 |
| 11959175 | Fill on demand ampoule refill | Tuan Nguyen, Eashwar Ranganathan, Shankar Swaminathan, Adrien LaVoie, Chloe Baldasseroni +2 more | 2024-04-16 |
| 11959172 | Substrate processing systems including gas delivery system with reduced dead legs | Antonio Xavier, Frank L. Pasquale, Ryan Blaquiere, Jennifer Leigh Petraglia, Meenakshi Mamunuru | 2024-04-16 |
| 11908715 | Dynamic temperature control of substrate support in substrate processing system | Sairam Sundaram, Aaron Durbin | 2024-02-20 |
| 11725282 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Douglas Keil, Edward Augustyniak, Karl Leeser | 2023-08-15 |
| 11661654 | Substrate processing systems including gas delivery system with reduced dead legs | Antonio Xavier, Frank L. Pasquale, Ryan Blaquiere, Jennifer Leigh Petraglia, Meenakshi Mamunuru | 2023-05-30 |
| 11443975 | Planar substrate edge contact with open volume equalization pathways and side containment | Patrick Breiling, Karl Leeser, Paul Konkola, Adrien LaVoie, Chloe Baldasseroni +7 more | 2022-09-13 |
| 11332824 | Systems and methods for reducing effluent build-up in a pumping exhaust system | Antonio Xavier, Steven Goza, Adrien LaVoie, Joseph Nesmith | 2022-05-17 |
| 11236422 | Multi zone substrate support for ALD film property correction and tunability | Michael Philip Roberts, Pulkit Agarwal, Aaron Bingham, Ashish Saurabh, Ravi Kumar +1 more | 2022-02-01 |
| 11232966 | Electrostatic chucking pedestal with substrate backside purging and thermal sinking | Timothy Scott Thomas, Patrick Breiling, Vincent E. Burkhart | 2022-01-25 |
| 11183400 | Progressive heating of components of substrate processing systems using TCR element-based heaters | Easwar Srinivasan | 2021-11-23 |
| 11111581 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Douglas Keil, Edward Augustyniak, Karl Leeser | 2021-09-07 |
| 11072860 | Fill on demand ampoule refill | Tuan Nguyen, Eashwar Ranganathan, Shankar Swaminathan, Adrien LaVoie, Chloe Baldasseroni +2 more | 2021-07-27 |
| 11075127 | Suppressing interfacial reactions by varying the wafer temperature throughout deposition | Seshasayee Varadarajan, Aaron R. Fellis, Andrew John McKerrow, James S. Sims, Jon Henri | 2021-07-27 |
| 11028482 | Use of voltage and current measurements to control dual zone ceramic pedestals | Aaron Durbin, Dirk Rudolph, Thomas G. Jewell | 2021-06-08 |