Issued Patents All Time
Showing 26–50 of 56 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10808317 | Deposition apparatus including an isothermal processing zone | Jeremy Tucker, Karl Leeser, Alan M. Schoepp | 2020-10-20 |
| 10781516 | Chemical deposition chamber having gas seal | Jeremy Tucker, Saangrut Sangplung | 2020-09-22 |
| 10741365 | Low volume showerhead with porous baffle | Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale, Hu Kang, Adrien LaVoie | 2020-08-11 |
| 10633742 | Use of voltage and current measurements to control dual zone ceramic pedestals | Aaron Durbin, Dirk Rudolph, Thomas G. Jewell | 2020-04-28 |
| 10622243 | Planar substrate edge contact with open volume equalization pathways and side containment | Patrick Breiling, Karl Leeser, Paul Konkola, Adrien LaVoie, Chloe Baldasseroni +7 more | 2020-04-14 |
| 10378107 | Low volume showerhead with faceplate holes for improved flow uniformity | Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale, Hu Kang, Adrien LaVoie +6 more | 2019-08-13 |
| 10347547 | Suppressing interfacial reactions by varying the wafer temperature throughout deposition | Seshasayee Varadarajan, Aaron R. Fellis, Andrew John McKerrow, James S. Sims, Jon Henri | 2019-07-09 |
| 10323323 | Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition | Jennifer O'Loughlin, Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale, Chloe Baldasseroni +1 more | 2019-06-18 |
| 10301718 | Asymmetric pedestal/carrier ring arrangement for edge impedance modulation | Ryan Blaquiere, Shankar Swaminathan, Yukinori Sakiyama | 2019-05-28 |
| 10287683 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Douglas Keil, Edward Augustyniak, Karl Leeser | 2019-05-14 |
| 10157755 | Purge and pumping structures arranged beneath substrate plane to reduce defects | Shankar Swaminathan, Adrien LaVoie | 2018-12-18 |
| 10128116 | Integrated direct dielectric and metal deposition | William T. Lee, Bart J. van Schravendijk, David Charles Smith, Michal Danek, Patrick A. Van Cleemput | 2018-11-13 |
| 10128160 | Systems and methods for detection of plasma instability by electrical measurement | Yukinori Sakiyama, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Edward Augustyniak +1 more | 2018-11-13 |
| 10020188 | Method for depositing ALD films using halide-based precursors | James S. Sims, Jon Henri, Andrew John McKerrow, Seshasayee Varadarajan, Kathryn M. Kelchner | 2018-07-10 |
| 9997422 | Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability | Ishtak Karim, Yukinori Sakiyama, Yaswanth Rangineni, Edward Augustyniak, Douglas Keil +2 more | 2018-06-12 |
| 9970108 | Systems and methods for vapor delivery in a substrate processing system | Jun Qian, Hu Kang, Purushottam Kumar, Chloe Baldasseroni, Heather Landis +11 more | 2018-05-15 |
| 9870917 | Variable temperature hardware and methods for reduction of wafer backside deposition | Hu Kang, Ishtak Karim, Purushottam Kumar, Jun Qian, Adrien LaVoie | 2018-01-16 |
| 9824884 | Method for depositing metals free ald silicon nitride films using halide-based precursors | James S. Sims, Jon Henri, Andrew John McKerrow, Seshasayee Varadarajan, Kathryn M. Kelchner | 2017-11-21 |
| 9824941 | Systems and methods for detection of plasma instability by electrical measurement | Yukinori Sakiyama, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Edward Augustyniak +1 more | 2017-11-21 |
| 9758868 | Plasma suppression behind a showerhead through the use of increased pressure | Patrick Breiling, Edmund Minshall, Colin F. Smith, Andrew Duvall, Karl Leeser | 2017-09-12 |
| 9698042 | Wafer centering in pocket to improve azimuthal thickness uniformity at wafer edge | Chloe Baldasseroni, Ted Minshall, Frank L. Pasquale, Shankar Swaminathan | 2017-07-04 |
| 9677176 | Multi-plenum, dual-temperature showerhead | Jennifer Leigh Petraglia | 2017-06-13 |
| 9631276 | Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition | Jennifer O'Loughlin, Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale, Chloe Baldasseroni +1 more | 2017-04-25 |
| 9490149 | Chemical deposition apparatus having conductance control | Karl Leeser, Chunguang Xia, Jeremy Tucker | 2016-11-08 |
| 9388494 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Douglas Keil, Edward Augustyniak, Karl Leeser | 2016-07-12 |