Issued Patents All Time
Showing 1–25 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12308216 | Mechanical suppression of parasitic plasma in substrate processing chamber | Douglas Keil, Karl Leeser, Mohamed Sabri | 2025-05-20 |
| 12143087 | Combiner and distributor for adjusting impedances or power across multiple plasma processing stations | Sunil Kapoor, George Thomas, Yaswanth Rangineni | 2024-11-12 |
| 11862435 | Mechanical suppression of parasitic plasma in substrate processing chamber | Douglas Keil, Karl Leeser, Mohamed Sabri | 2024-01-02 |
| 11823928 | Control of wafer bow in multiple stations | David French, Sunil Kapoor, Yukinori Sakiyama, George Thomas | 2023-11-21 |
| 11725282 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Ramesh Chandrasekharan, Douglas Keil, Karl Leeser | 2023-08-15 |
| 11621150 | Mechanical suppression of parasitic plasma in substrate processing chamber | Douglas Keil, Karl Leeser, Mohamed Sabri | 2023-04-04 |
| 11393729 | Systems and methods for controlling plasma instability in semiconductor fabrication | Yukinori Sakiyama, Douglas Keil | 2022-07-19 |
| 11258421 | Combiner and distributor for adjusting impedances or power across multiple plasma processing stations | Sunil Kapoor, George Thomas, Yaswanth Rangineni | 2022-02-22 |
| 11183406 | Control of wafer bow in multiple stations | David French, Sunil Kapoor, Yukinori Sakiyama, George Thomas | 2021-11-23 |
| 11127567 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2021-09-21 |
| 11111581 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Ramesh Chandrasekharan, Douglas Keil, Karl Leeser | 2021-09-07 |
| 10876209 | Systems and methods for determining film thickness using DC self-bias voltage | Douglas Keil | 2020-12-29 |
| 10665429 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2020-05-26 |
| 10619245 | Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate | Jeremy Tucker | 2020-04-14 |
| 10622962 | Combiner and distributor for adjusting impedances or power across multiple plasma processing stations | Sunil Kapoor, George Thomas, Yaswanth Rangineni | 2020-04-14 |
| 10553465 | Control of water bow in multiple stations | David French, Sunil Kapoor, Yukinori Sakiyama, George Thomas | 2020-02-04 |
| 10510625 | Systems and methods for controlling plasma instability in semiconductor fabrication | Yukinori Sakiyama, Douglas Keil | 2019-12-17 |
| 10378109 | Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage | Douglas Keil | 2019-08-13 |
| 10378107 | Low volume showerhead with faceplate holes for improved flow uniformity | Ramesh Chandrasekharan, Saangrut Sangplung, Shankar Swaminathan, Frank L. Pasquale, Hu Kang +6 more | 2019-08-13 |
| 10287683 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Ramesh Chandrasekharan, Douglas Keil, Karl Leeser | 2019-05-14 |
| 10224182 | Mechanical suppression of parasitic plasma in substrate processing chamber | Douglas Keil, Karl Leeser, Mohamed Sabri | 2019-03-05 |
| 10187032 | Combiner and distributor for adjusting impedances or power across multiple plasma processing stations | Sunil Kapoor, George Thomas, Yaswanth Rangineni | 2019-01-22 |
| 10128160 | Systems and methods for detection of plasma instability by electrical measurement | Yukinori Sakiyama, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Ramesh Chandrasekharan +1 more | 2018-11-13 |
| 10121708 | Systems and methods for detection of plasma instability by optical diagnosis | Yukinori Sakiyama, Douglas Keil | 2018-11-06 |
| 10081869 | Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates | Christopher Ramsayer, Akhil Singhal, Kareem Boumatar | 2018-09-25 |