Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10077497 | Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate | Jeremy Tucker | 2018-09-18 |
| 9997422 | Systems and methods for frequency modulation of radiofrequency power supply for controlling plasma instability | Ishtak Karim, Yukinori Sakiyama, Yaswanth Rangineni, Douglas Keil, Ramesh Chandrasekharan +2 more | 2018-06-12 |
| 9953887 | Measuring individual layer thickness during multi-layer deposition semiconductor processing | Boaz Kenane | 2018-04-24 |
| 9941113 | Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication | Douglas Keil, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Yukinori Sakiyama +2 more | 2018-04-10 |
| 9875883 | Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching | Yukinori Sakiyama, Yaswanth Rangineni, Jeremy Tucker, Douglas Keil, Sunil Kapoor | 2018-01-23 |
| 9824941 | Systems and methods for detection of plasma instability by electrical measurement | Yukinori Sakiyama, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Ramesh Chandrasekharan +1 more | 2017-11-21 |
| 9793096 | Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity | Hu Kang, Adrien LaVoie, Shankar Swaminathan, Jun Qian, Chloe Baldasseroni +8 more | 2017-10-17 |
| 9754769 | Metrology methods to detect plasma in wafer cavity and use of the metrology for station-to-station and tool-to-tool matching | Yukinori Sakiyama, Yaswanth Rangineni, Jeremy Tucker, Douglas Keil, Sunil Kapoor | 2017-09-05 |
| 9644271 | Systems and methods for using electrical asymmetry effect to control plasma process space in semiconductor fabrication | Douglas Keil, Ishtak Karim, Yaswanth Rangineni, Adrien LaVoie, Yukinori Sakiyama +2 more | 2017-05-09 |
| 9508547 | Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactors | Frank L. Pasquale, Chloe Baldasseroni, Yukinori Sakiyama, Shankar Swaminathan | 2016-11-29 |
| 9449795 | Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor | Mohamed Sabri, Douglas Keil, Ramkishan Rao Lingampalli, Karl Leeser, Cody Barnett | 2016-09-20 |
| 9404183 | Diagnostic and control systems and methods for substrate processing systems using DC self-bias voltage | Douglas Keil | 2016-08-02 |
| 9388494 | Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region | Chunguang Xia, Ramesh Chandrasekharan, Douglas Keil, Karl Leeser | 2016-07-12 |
| 8282983 | Closed loop control system for RF power balancing of the stations in a multi-station processing tool with shared RF source | Sunil Kapoor | 2012-10-09 |
| 8192806 | Plasma particle extraction process for PECVD | Sesha Varadarajan, Jeffrey C. Benzing | 2012-06-05 |
| 6716765 | Plasma clean for a semiconductor thin film deposition chamber | Aree Hanprasopwattana, Jason Tian, Bart J. van Schravendijk | 2004-04-06 |