Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11873369 | Polymers based on diisoalkenylarenes and uses thereof | Ruidong Ding, Chad Reiter | 2024-01-16 |
| 11851513 | Poly(cyclohexadiene) homopolymer based compositions and uses thereof | Ruidong Ding, Hannes Hendrik Peter van Erp, Chad Reiter | 2023-12-26 |
| 11732076 | Cyclic diene-based copolymers | Ruidong Ding, Hannes Hendrik Peter van Erp, Chad Reiter | 2023-08-22 |
| 11279813 | PVC plasticizers and methods for making thereof | Xiangyun Wei, H. Jerrold Miller, Jos H. M. Lange | 2022-03-22 |
| 11279849 | Deodorized rosin ester and methods for making | Ruidong Ding, Chad Reiter | 2022-03-22 |
| 11041095 | Desulfurized tall oil and derivatives thereof | Ruidong Ding, Chad Reiter | 2021-06-22 |
| 8034725 | Method of eliminating small bin defects in high throughput TEOS films | Jon Henri, Xingyuan Tang, Kevin Gerber, Arul N. Dhas | 2011-10-11 |
| 7704894 | Method of eliminating small bin defects in high throughput TEOS films | Jon Henri, Xingyuan Tang, Kevin Gerber, Arul N. Dhas | 2010-04-27 |
| 7052988 | Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing | Bart J. van Schravendijk, Ming Li, Tom Mountsier, M. Ziaul Karim | 2006-05-30 |
| 6844612 | Low dielectric constant fluorine-doped silica glass film for use in integrated circuit chips and method of forming the same | Wenxian Zhu, M. Ziaul Karim, Cong-Thanh DO | 2005-01-18 |
| 6720251 | Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing | Bart J. van Schravendijk, Ming Li, Tom Mountsier, M. Zlaul Karim | 2004-04-13 |
| 6716765 | Plasma clean for a semiconductor thin film deposition chamber | Aree Hanprasopwattana, Edward Augustyniak, Bart J. van Schravendijk | 2004-04-06 |
| 6541400 | Process for CVD deposition of fluorinated silicon glass layer on semiconductor wafer | Harald te Nijenhuis | 2003-04-01 |
| 6524956 | Method for controlling the grain size of tungsten films | Jon Henri | 2003-02-25 |
| 6303518 | Methods to improve chemical vapor deposited fluorosilicate glass (FSG) film adhesion to metal barrier or etch stop/diffusion barrier layers | M. Ziaul Karim, Bart J. van Schravendijk | 2001-10-16 |