| 12014921 |
Plasma enhanced wafer soak for thin film deposition |
Ming Li, Tu Hong |
2024-06-18 |
| 10704149 |
Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas |
Kareem Boumatar, Christopher Ramsayer |
2020-07-07 |
| 10047438 |
Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas |
Kareem Boumatar, Christopher Ramsayer |
2018-08-14 |
| 9617637 |
Systems and methods for improving deposition rate uniformity and reducing defects in substrate processing systems |
Brannon Kelley, Jaswinder Guiliani, Akhil Singhal |
2017-04-11 |
| 9570289 |
Method and apparatus to minimize seam effect during TEOS oxide film deposition |
— |
2017-02-14 |
| 9328416 |
Method for the reduction of defectivity in vapor deposited films |
Akhil Singhal, Ming Li, Kareem Boumatar |
2016-05-03 |
| 8034725 |
Method of eliminating small bin defects in high throughput TEOS films |
Jon Henri, Xingyuan Tang, Jason Tian, Kevin Gerber |
2011-10-11 |
| 8017527 |
Method and apparatus to reduce defects in liquid based PECVD films |
Ming Li, Joseph Bradley Laird |
2011-09-13 |
| 7704894 |
Method of eliminating small bin defects in high throughput TEOS films |
Jon Henri, Xingyuan Tang, Jason Tian, Kevin Gerber |
2010-04-27 |
