Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12374569 | Batch processing oven for magnetic anneal | Christopher Lane | 2025-07-29 |
| 11942365 | Multi-region diffusion barrier containing titanium, silicon and nitrogen | Vinayak Veer Vats, Bo Seon Choi, Somilkumar J. Rathi, Niloy Mukherjee | 2024-03-26 |
| 11401607 | TiSiN coating method | Vinayak Veer Vats, Bo Seon Choi | 2022-08-02 |
| 7981472 | Methods of providing uniform gas delivery to a reactor | Jeremie J. Dalton, Ana R. Londergan | 2011-07-19 |
| 7595088 | Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology | Bikram Kapoor, Anchuan Wang | 2009-09-29 |
| 7294588 | In-situ-etch-assisted HDP deposition | Dongqing Li, Jeong Soo Byun, Thanh Pham | 2007-11-13 |
| 7205240 | HDP-CVD multistep gapfill process | Bikram Kapoor, Anchuan Wang, Dong Li, Katsunari Ozeki, Manoj Vellaikal +1 more | 2007-04-17 |
| 7052988 | Applications and methods of making nitrogen-free anti-reflective layers for semiconductor processing | Bart J. van Schravendijk, Ming Li, Jason Tian, Tom Mountsier | 2006-05-30 |
| 7049211 | In-situ-etch-assisted HDP deposition using SiF4 | Dongqing Li, Jeong Soo Byun, Thanh Pham | 2006-05-23 |
| 7033945 | Gap filling with a composite layer | Jeong Soo Byun, Zheng Yuan, Shankar Venkataraman, Thanh Pham, Ellie Yieh | 2006-04-25 |
| 6958112 | Methods and systems for high-aspect-ratio gapfill using atomic-oxygen generation | Farhad Moghadam, Siamak Salimian | 2005-10-25 |
| 6903031 | In-situ-etch-assisted HDP deposition using SiF4 and hydrogen | Dongqing Li, Jeong Soo Byun, Thanh Pham | 2005-06-07 |
| 6844612 | Low dielectric constant fluorine-doped silica glass film for use in integrated circuit chips and method of forming the same | Jason Tian, Wenxian Zhu, Cong-Thanh DO | 2005-01-18 |
| 6808748 | Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology | Bikram Kapoor, Anchuan Wang | 2004-10-26 |
| 6417092 | Low dielectric constant etch stop films | Sanjeev Kumar Jain, Somnath Nag, Gerrit J Kooi, Kenneth P. MacWilliams | 2002-07-09 |
| 6303518 | Methods to improve chemical vapor deposited fluorosilicate glass (FSG) film adhesion to metal barrier or etch stop/diffusion barrier layers | Jason Tian, Bart J. van Schravendijk | 2001-10-16 |