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Reactive ion etching for semiconductor device feature topography modification |
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2009-12-08 |
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Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology |
M. Ziaul Karim, Anchuan Wang |
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Oxygen plasma treatment for enhanced HDP-CVD gapfill |
Hemant P. Mungekar, Young S. Lee, Manoj Vellaikal, Karen Greig |
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HDP-CVD multistep gapfill process |
M. Ziaul Karim, Anchuan Wang, Dong Li, Katsunari Ozeki, Manoj Vellaikal +1 more |
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Padmanabhan Krishnaraj, Bruno Geoffrion, Michael S. Cox, Lin Zhang, Anchuan Wang +1 more |
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Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology |
M. Ziaul Karim, Anchuan Wang |
2004-10-26 |
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High density plasma CVD process for gapfill into high aspect ratio features |
Farhan Ahmad, Michael Awdshiew, Alok Jain |
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Controlled method of silicon-rich oxide deposition using HDP-CVD |
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2002-10-01 |