BK

Bikram Kapoor

Applied Materials: 8 patents #1,541 of 7,310Top 25%
Overall (All Time): #658,517 of 4,157,543Top 20%
8
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
7628897 Reactive ion etching for semiconductor device feature topography modification Hemant P. Mungekar, Anjana M. Patel, Manoj Vellaikal, Anchuan Wang 2009-12-08
7595088 Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology M. Ziaul Karim, Anchuan Wang 2009-09-29
7229931 Oxygen plasma treatment for enhanced HDP-CVD gapfill Hemant P. Mungekar, Young S. Lee, Manoj Vellaikal, Karen Greig 2007-06-12
7205240 HDP-CVD multistep gapfill process M. Ziaul Karim, Anchuan Wang, Dong Li, Katsunari Ozeki, Manoj Vellaikal +1 more 2007-04-17
6890597 HDP-CVD uniformity control Padmanabhan Krishnaraj, Bruno Geoffrion, Michael S. Cox, Lin Zhang, Anchuan Wang +1 more 2005-05-10
6808748 Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology M. Ziaul Karim, Anchuan Wang 2004-10-26
6802944 High density plasma CVD process for gapfill into high aspect ratio features Farhan Ahmad, Michael Awdshiew, Alok Jain 2004-10-12
6458722 Controlled method of silicon-rich oxide deposition using HDP-CVD Kent Rossman 2002-10-01