Issued Patents All Time
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7628897 | Reactive ion etching for semiconductor device feature topography modification | Hemant P. Mungekar, Anjana M. Patel, Manoj Vellaikal, Anchuan Wang | 2009-12-08 |
| 7595088 | Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology | M. Ziaul Karim, Anchuan Wang | 2009-09-29 |
| 7229931 | Oxygen plasma treatment for enhanced HDP-CVD gapfill | Hemant P. Mungekar, Young S. Lee, Manoj Vellaikal, Karen Greig | 2007-06-12 |
| 7205240 | HDP-CVD multistep gapfill process | M. Ziaul Karim, Anchuan Wang, Dong Li, Katsunari Ozeki, Manoj Vellaikal +1 more | 2007-04-17 |
| 6890597 | HDP-CVD uniformity control | Padmanabhan Krishnaraj, Bruno Geoffrion, Michael S. Cox, Lin Zhang, Anchuan Wang +1 more | 2005-05-10 |
| 6808748 | Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology | M. Ziaul Karim, Anchuan Wang | 2004-10-26 |
| 6802944 | High density plasma CVD process for gapfill into high aspect ratio features | Farhan Ahmad, Michael Awdshiew, Alok Jain | 2004-10-12 |
| 6458722 | Controlled method of silicon-rich oxide deposition using HDP-CVD | Kent Rossman | 2002-10-01 |