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Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD |
— |
2008-11-25 |
| 7294205 |
Method for reducing the intrinsic stress of high density plasma films |
K. V. Ravi, Turgut Sahin, Pravin K. Narwankar |
2007-11-13 |
| 7159597 |
Multistep remote plasma clean process |
Zhong Qiang Hua, Zhengquan Tan, Zhuang Li |
2007-01-09 |
| 7132134 |
Staggered in-situ deposition and etching of a dielectric layer for HDP CVD |
— |
2006-11-07 |
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Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput |
— |
2005-01-25 |
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Method of cleaning a semiconductor processing chamber |
— |
2005-01-18 |
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Staggered in-situ deposition and etching of a dielectric layer for HDP CVD |
— |
2004-11-23 |
| 6704913 |
In situ wafer heat for reduced backside contamination |
— |
2004-03-09 |
| 6696362 |
Method for using an in situ particle sensor for monitoring particle performance in plasma deposition processes |
Leonard J. Olmer, Phillip D. Nguyen |
2004-02-24 |
| 6589868 |
Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput |
— |
2003-07-08 |
| 6559052 |
Deposition of amorphous silicon films by high density plasma HDP-CVD at low temperatures |
Zhuang Li, Tzuyuan Yiin |
2003-05-06 |
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Trench fill with HDP-CVD process including coupled high power density plasma deposition |
Zhuang Li, Young Kwang Lee |
2003-05-06 |
| 6527910 |
Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD |
— |
2003-03-04 |
| 6524969 |
High density plasma chemical vapor deposition (HDP-CVD) processing of gallium arsenide wafers |
Zhuang Li, Tzuyuan Yiin, Lung-Tien Han |
2003-02-25 |
| 6514870 |
In situ wafer heat for reduced backside contamination |
— |
2003-02-04 |
| 6458722 |
Controlled method of silicon-rich oxide deposition using HDP-CVD |
Bikram Kapoor |
2002-10-01 |
| 6194038 |
Method for deposition of a conformal layer on a substrate |
— |
2001-02-27 |
| 6121161 |
Reduction of mobile ion and metal contamination in HDP-CVD chambers using chamber seasoning film depositions |
Turgut Sahin, Hichem M'Saad, Romuald Nowak |
2000-09-19 |
| 6077357 |
Orientless wafer processing on an electrostatic chuck |
Shijian Li, Brian Lue |
2000-06-20 |
| 5976993 |
Method for reducing the intrinsic stress of high density plasma films |
K. V. Ravi, Turgut Sahin, Pravin K. Narwankar |
1999-11-02 |
| 5811356 |
Reduction in mobile ion and metal contamination by varying season time and bias RF power during chamber cleaning |
Laxman Murugesh, Pravin K. Narwankar, Turgut Sahin |
1998-09-22 |
| 5748434 |
Shield for an electrostatic chuck |
Brian Lue, Fred C. Redeker |
1998-05-05 |
