| 11007618 |
Printing chemical mechanical polishing pad having window or controlled porosity |
Kadthala Ramaya Narendmath |
2021-05-18 |
| 9993907 |
Printed chemical mechanical polishing pad having printed window |
Kadthala Ramaya Narendrnath |
2018-06-12 |
| 9481608 |
Surface annealing of components for substrate processing chambers |
Ashish Bhatnagar, Padma Gopalakrishnan |
2016-11-01 |
| 8617672 |
Localized surface annealing of components for substrate processing chambers |
Ashish Bhatnagar, Padma Gopalakrishnan |
2013-12-31 |
| 7732056 |
Corrosion-resistant aluminum component having multi-layer coating |
Ashish Bhatnagar |
2010-06-08 |
| 7431772 |
Gas distributor having directed gas flow and cleaning method |
Padmanabhan Krishnaraj, Carl A. Dunham |
2008-10-07 |
| 7135426 |
Erosion resistant process chamber components |
Stan Detmar, Ho Fang |
2006-11-14 |
| 6878214 |
Process endpoint detection in processing chambers |
Gary R. Ahr |
2005-04-12 |
| 6579811 |
Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps through wafer heating |
Pravin K. Narwankar, Sameer Desai, Walter Zygmunt, Turgut Sahin |
2003-06-17 |
| 6450117 |
Directing a flow of gas in a substrate processing chamber |
Padmanaban Krishnaraj, Michael S. Cox, Canfeng Lai, Narendra Dubey, Tom K. Cho +2 more |
2002-09-17 |
| 6375744 |
Sequential in-situ heating and deposition of halogen-doped silicon oxide |
Maciek Orczyk, Pravin Narawankar, Jianmin Qiao, Turgut Sahin |
2002-04-23 |
| 6228781 |
Sequential in-situ heating and deposition of halogen-doped silicon oxide |
Maciek Orczyk, Pravin Narawankar, Jianmin Qiao, Turgut Sahin |
2001-05-08 |
| 6217658 |
Sequencing of the recipe steps for the optimal low-dielectric constant HDP-CVD Processing |
Maciek Orczyk, Pravin K. Narwankar |
2001-04-17 |
| 6200911 |
Method and apparatus for modifying the profile of narrow, high-aspect-ratio gaps using differential plasma power |
Pravin K. Narwankar, Sameer Desai, Walter Zygmunt, Turgut Sahin |
2001-03-13 |
| 6159333 |
Substrate processing system configurable for deposition or cleaning |
Anand Gupta, Srihari Ponnekanti, Gana A. Rimple |
2000-12-12 |
| 6136685 |
High deposition rate recipe for low dielectric constant films |
Pravin K. Narwankar, Turgut Sahin, Maciek Orczyk, Jianmin Qiao |
2000-10-24 |
| 5997685 |
Corrosion-resistant apparatus |
Charles K. Radhamohan, Srihari Ponnekanti |
1999-12-07 |
| 5994662 |
Unique baffle to deflect remote plasma clean gases |
— |
1999-11-30 |
| 5937323 |
Sequencing of the recipe steps for the optimal low-k HDP-CVD processing |
Maciek Orczyk, Pravin K. Narwankar |
1999-08-10 |
| 5810937 |
Using ceramic wafer to protect susceptor during cleaning of a processing chamber |
Anand Gupta, Srihari Ponnekanti, Gana A. Rimple |
1998-09-22 |
| 5811195 |
Corrosion-resistant aluminum article for semiconductor processing equipment |
Craig Bercaw, Joshua E. Byrne |
1998-09-22 |
| 5811356 |
Reduction in mobile ion and metal contamination by varying season time and bias RF power during chamber cleaning |
Pravin K. Narwankar, Turgut Sahin, Kent Rossman |
1998-09-22 |
| 5756222 |
Corrosion-resistant aluminum article for semiconductor processing equipment |
Craig Bercaw, Joshua E. Byrne |
1998-05-26 |
