Issued Patents All Time
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12216192 | Angular and linear movement detection and compensation for user equipment | Justin MCGLOIN, Victor Kulik | 2025-02-04 |
| 9190208 | Metal-insulator-metal capacitors on glass substrates | Jon Bradley Lasiter, Ravindra V. Shenoy, Donald William Kidwell, Jr., Victor L. Pushparaj, Kwan-Yu Lai | 2015-11-17 |
| 8536059 | Equipment and methods for etching of MEMS | Khurshid Syed Alam, Evgeni Gousev, Marc Mignard, David Heald, Philip D. Floyd | 2013-09-17 |
| 8323516 | Etching processes used in MEMS production | Ion Bita, Evgeni Gousev, Xiaoming Yan | 2012-12-04 |
| 8164815 | MEMS cavity-coating layers and methods | Bangalore R. Natarajan, Evgeni Gousev, James Randolph Webster, David Heald | 2012-04-24 |
| 7981473 | Transient enhanced atomic layer deposition | Gi Youl Kim, Anuranjan Srivastava, Thomas E. Seidel, Sasangan Ramanathan | 2011-07-19 |
| 7981472 | Methods of providing uniform gas delivery to a reactor | Jeremie J. Dalton, M. Ziaul Karim | 2011-07-19 |
| 7733552 | MEMS cavity-coating layers and methods | Bangalore R. Natarajan, Evgeni Gousev, James Randolph Webster, David Heald | 2010-06-08 |
| 7183649 | Methods and procedures for engineering of composite conductive films by atomic layer deposition | Thomas E. Seidel | 2007-02-27 |
| 7164203 | Methods and procedures for engineering of composite conductive by atomic layer deposition | Thomas E. Seidel | 2007-01-16 |
| 7129580 | Methods and procedures for engineering of composite conductive films by atomic layer deposition | Thomas E. Seidel | 2006-10-31 |
| 6905547 | Method and apparatus for flexible atomic layer deposition | Thomas E. Seidel, Lawrence D. Matthysse, Ed C. Lee | 2005-06-14 |
| 6720259 | Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition | Sasangan Ramanathan, Jereld Lee Winkler, Thomas E. Seidel | 2004-04-13 |
| 6346477 | Method of interlayer mediated epitaxy of cobalt silicide from low temperature chemical vapor deposition of cobalt | Alain E. Kaloyeros, Barry C. Arkles | 2002-02-12 |