TS

Thomas E. Seidel

GE Genus: 13 patents #2 of 76Top 3%
AT AT&T: 3 patents #5,550 of 18,772Top 30%
BL Bell Telephone Laboratories: 2 patents #297 of 1,445Top 25%
SE Sematech: 2 patents #22 of 123Top 20%
AI Aixtron: 1 patents #31 of 62Top 50%
HG Hyperstone Gmbh: 1 patents #8 of 17Top 50%
SG Solarworld Innovations Gmbh: 1 patents #19 of 49Top 40%
Overall (All Time): #122,874 of 4,157,543Top 3%
30
Patents All Time

Issued Patents All Time

Showing 25 most recent of 30 patents

Patent #TitleCo-InventorsDate
D1018756 Rifle 2024-03-19
10996562 Method and structure for nanoimprint lithography masks using optical film coatings 2021-05-04
10923359 Limited dose and angle directed beam assisted ALE and ALD processes for localized coatings on non-planar surfaces Michael I. Current 2021-02-16
10896823 Limited dose atomic layer processes for localizing coatings on non-planar surfaces Michael I. Current 2021-01-19
10156786 Method and structure for nanoimprint lithography masks using optical film coatings 2018-12-18
9311234 Method for reliably addressing a large flash memory and flash memory Martin Roeder 2016-04-12
9246042 Method for contacting and connecting solar cells Matthias Schaarschmidt, Thilo Richter, Wolfgang Enger, Paul Grunow, Martin Kutzer +3 more 2016-01-26
7981473 Transient enhanced atomic layer deposition Gi Youl Kim, Anuranjan Srivastava, Ana R. Londergan, Sasangan Ramanathan 2011-07-19
7183649 Methods and procedures for engineering of composite conductive films by atomic layer deposition Ana R. Londergan 2007-02-27
7164203 Methods and procedures for engineering of composite conductive by atomic layer deposition Ana R. Londergan 2007-01-16
7129580 Methods and procedures for engineering of composite conductive films by atomic layer deposition Ana R. Londergan 2006-10-31
6905547 Method and apparatus for flexible atomic layer deposition Ana R. Londergan, Lawrence D. Matthysse, Ed C. Lee 2005-06-14
6902624 Massively parallel atomic layer deposition/chemical vapor deposition system Adrian Jansz, Jurek Puchacz, Ken Doering 2005-06-07
6897119 Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition Ofer Sneh, Carl Galewski 2005-05-24
6720259 Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition Ana R. Londergan, Sasangan Ramanathan, Jereld Lee Winkler 2004-04-13
6638859 Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition Ofer Sneh, Carl Galewski 2003-10-28
6635570 PECVD and CVD processes for WNx deposition Carl Galewski, Claude A. Sands, Hector Velasco, Lawrence D. Matthysse 2003-10-21
6551399 Fully integrated process for MIM capacitors using atomic layer deposition Ofer Sneh 2003-04-22
6502605 Process for the production of a face-to-face carpet fabric Rainer Goessl 2003-01-07
6503330 Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition Ofer Sneh, Carl Galewski 2003-01-07
6387185 Processing chamber for atomic layer deposition processes Kenneth Brian Doering, Carl Galewski, Prasad N. Gadgil 2002-05-14
6174377 Processing chamber for atomic layer deposition processes Kenneth Brian Doering, Carl Galewski, Prasad N. Gadgil 2001-01-16
6100184 Method of making a dual damascene interconnect structure using low dielectric constant material for an inter-level dielectric layer Bin Zhao, Prahalad K. Vasudev, Ronald S. Horwath, Peter M. Zeitzoff 2000-08-08
6037664 Dual damascene interconnect structure using low dielectric constant material for an inter-level dielectric layer Bin Zhao, Prahalad K. Vasudev, Ronald S. Horwath, Peter M. Zeitzoff 2000-03-14
5879459 Vertically-stacked process reactor and cluster tool system for atomic layer deposition Prasad N. Gadgil 1999-03-09