Thomas E. Seidel — 30 Patents at Genus

Thomas E. Seidel has been granted 30 US patents while listed as an inventor at Genus. The first was granted in 1981 and the most recent in March 2024. Thomas E. Seidel ranks #121,623 of 4,157,543 US inventors in our database (top 2.9%). Patent records list Thomas E. Seidel in Konstanz, FL, DE.

Issued Patents All Time

Showing 1–25 of 30 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
D1018756	Rifle	—	2024-03-19
10996562	Method and structure for nanoimprint lithography masks using optical film coatings	—	2021-05-04
10923359	Limited dose and angle directed beam assisted ALE and ALD processes for localized coatings on non-planar surfaces	Michael I. Current	2021-02-16
10896823	Limited dose atomic layer processes for localizing coatings on non-planar surfaces	Michael I. Current	2021-01-19
10156786	Method and structure for nanoimprint lithography masks using optical film coatings	—	2018-12-18
9311234	Method for reliably addressing a large flash memory and flash memory	Martin Roeder	2016-04-12
9246042	Method for contacting and connecting solar cells	Matthias Schaarschmidt, Thilo Richter, Wolfgang Enger, Paul Grunow, Martin Kutzer +3 more	2016-01-26
7981473	Transient enhanced atomic layer deposition	Gi Youl Kim, Anuranjan Srivastava, Ana R. Londergan, Sasangan Ramanathan	2011-07-19
7183649	Methods and procedures for engineering of composite conductive films by atomic layer deposition	Ana R. Londergan	2007-02-27
7164203	Methods and procedures for engineering of composite conductive by atomic layer deposition	Ana R. Londergan	2007-01-16
7129580	Methods and procedures for engineering of composite conductive films by atomic layer deposition	Ana R. Londergan	2006-10-31
6905547	Method and apparatus for flexible atomic layer deposition	Ana R. Londergan, Lawrence D. Matthysse, Ed C. Lee	2005-06-14
6902624	Massively parallel atomic layer deposition/chemical vapor deposition system	Adrian Jansz, Jurek Puchacz, Ken Doering	2005-06-07
6897119	Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition	Ofer Sneh, Carl Galewski	2005-05-24
6720259	Passivation method for improved uniformity and repeatability for atomic layer deposition and chemical vapor deposition	Ana R. Londergan, Sasangan Ramanathan, Jereld Lee Winkler	2004-04-13	$2,649,000
6638859	Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition	Ofer Sneh, Carl Galewski	2003-10-28	$1,559,000
6635570	PECVD and CVD processes for WNx deposition	Carl Galewski, Claude A. Sands, Hector Velasco, Lawrence D. Matthysse	2003-10-21
6551399	Fully integrated process for MIM capacitors using atomic layer deposition	Ofer Sneh	2003-04-22	$1,386,000
6502605	Process for the production of a face-to-face carpet fabric	Rainer Goessl	2003-01-07
6503330	Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition	Ofer Sneh, Carl Galewski	2003-01-07	$1,712,000
6387185	Processing chamber for atomic layer deposition processes	Kenneth Brian Doering, Carl Galewski, Prasad N. Gadgil	2002-05-14	$1,968,000
6174377	Processing chamber for atomic layer deposition processes	Kenneth Brian Doering, Carl Galewski, Prasad N. Gadgil	2001-01-16	$1,468,000
6100184	Method of making a dual damascene interconnect structure using low dielectric constant material for an inter-level dielectric layer	Bin Zhao, Prahalad K. Vasudev, Ronald S. Horwath, Peter M. Zeitzoff	2000-08-08	$63,224,000
6037664	Dual damascene interconnect structure using low dielectric constant material for an inter-level dielectric layer	Bin Zhao, Prahalad K. Vasudev, Ronald S. Horwath, Peter M. Zeitzoff	2000-03-14
5879459	Vertically-stacked process reactor and cluster tool system for atomic layer deposition	Prasad N. Gadgil	1999-03-09	$1,070,000

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Thomas E. Seidel — 30 Patents

Issued Patents All Time

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