Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10526708 | Methods for forming thin protective and optical layers on substrates | Stephen E. Savas, Hood Chatham, Sai Mantripragada, Allan B. Wiesnoski, Sooyun Joh | 2020-01-07 |
| 10294562 | Exhaust manifold in a CVD reactor | Stephen E. Savas, Merim MUKINOVIC | 2019-05-21 |
| 10049859 | Plasma generating units for processing a substrate | Stephen E. Savas, Allan B. Wiesnoski, Sai Mantripragada, Sooyun Joh | 2018-08-14 |
| 9831466 | Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrier | Stephen E. Savas, Allan B. Wiesnoski | 2017-11-28 |
| 9443702 | Methods for plasma processing | Stephen E. Savas, Allan B. Wiesnoski, Sai Mantripragada, Sooyun Joh | 2016-09-13 |
| 9359674 | Apparatus and method for dielectric deposition | Stephen E. Savas, Sai Mantripragada, Sooyun Joh, Allan B. Wiesnoski | 2016-06-07 |
| 9299956 | Method for deposition of high-performance coatings and encapsulated electronic devices | Stephen E. Savas, Allan B. Wiesnoski, Hood Chatham | 2016-03-29 |
| 9096932 | Methods for plasma processing | Stephen E. Savas, Allan B. Wiesnoski, Sai Mantripragada, Sooyun Joh | 2015-08-04 |
| 9096933 | Methods for plasma processing | Stephen E. Savas, Allan B. Wiesnoski, Sai Mantripragada, Sooyun Joh | 2015-08-04 |
| 8765232 | Apparatus and method for dielectric deposition | Stephen E. Savas, Sai Mantripragada, Sooyun Joh, Allan B. Wiesnoski | 2014-07-01 |
| 8697197 | Methods for plasma processing | Stephen E. Savas, Allan B. Wiesnoski, Sai Mantripragada, Sooyun Joh | 2014-04-15 |
| 6897119 | Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition | Ofer Sneh, Thomas E. Seidel | 2005-05-24 |
| 6818067 | Processing chamber for atomic layer deposition processes | Kenneth Brian Doering | 2004-11-16 |
| 6638859 | Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition | Ofer Sneh, Thomas E. Seidel | 2003-10-28 |
| 6635570 | PECVD and CVD processes for WNx deposition | Claude A. Sands, Hector Velasco, Lawrence D. Matthysse, Thomas E. Seidel | 2003-10-21 |
| 6540838 | Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition | Ofer Sneh | 2003-04-01 |
| 6538327 | Method of copper interconnect formation using atomic layer copper deposition and a device thereby formed | Sergey Lopatin, Takeshi Nogami | 2003-03-25 |
| 6503330 | Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition | Ofer Sneh, Thomas E. Seidel | 2003-01-07 |
| 6479902 | Semiconductor catalytic layer and atomic layer deposition thereof | Sergey Lopatin | 2002-11-12 |
| 6451119 | Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition | Ofer Sneh | 2002-09-17 |
| 6387185 | Processing chamber for atomic layer deposition processes | Kenneth Brian Doering, Prasad N. Gadgil, Thomas E. Seidel | 2002-05-14 |
| 6368954 | Method of copper interconnect formation using atomic layer copper deposition | Sergey Lopatin, Takeshi Nogami | 2002-04-09 |
| 6305314 | Apparatus and concept for minimizing parasitic chemical vapor deposition during atomic layer deposition | Ofer Sneh | 2001-10-23 |
| 6174377 | Processing chamber for atomic layer deposition processes | Kenneth Brian Doering, Prasad N. Gadgil, Thomas E. Seidel | 2001-01-16 |
| 5855675 | Multipurpose processing chamber for chemical vapor deposition processes | Kenneth Brian Doering | 1999-01-05 |