Issued Patents All Time
Showing 25 most recent of 37 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10890282 | Face sealed fittings | Lee E. Vestman, Steven F. Ruhnke | 2021-01-12 |
| 10465817 | Fluid-actuated flow control valves | — | 2019-11-05 |
| 9909682 | Fluid-actuated flow control valves | — | 2018-03-06 |
| 9181097 | Apparatus and methods for safely providing hazardous reactants | Jereld Lee Winkler | 2015-11-10 |
| 8673394 | Deposition method and apparatus | — | 2014-03-18 |
| 8451582 | Capacitors with high energy storage density and low ESR | Anat Sneh | 2013-05-28 |
| 8252116 | Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems | — | 2012-08-28 |
| 8083205 | Fail safe pneumatically actuated valve with fast time response and adjustable conductance | — | 2011-12-27 |
| 8012261 | ALD apparatus and method | — | 2011-09-06 |
| 7744060 | Fail-safe pneumatically actuated valve with fast time response and adjustable conductance | — | 2010-06-29 |
| 7682454 | Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems | — | 2010-03-23 |
| 7662233 | ALD apparatus and method | — | 2010-02-16 |
| 7635502 | ALD apparatus and method | — | 2009-12-22 |
| 7608539 | ALD method and apparatus | — | 2009-10-27 |
| 7250083 | ALD method and apparatus | — | 2007-07-31 |
| 6911092 | ALD apparatus and method | — | 2005-06-28 |
| 6897119 | Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition | Thomas E. Seidel, Carl Galewski | 2005-05-24 |
| 6897508 | Integrated capacitor with enhanced capacitance density and method of fabricating same | — | 2005-05-24 |
| 6863021 | Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD) | — | 2005-03-08 |
| 6638862 | Radical-assisted sequential CVD | — | 2003-10-28 |
| 6638859 | Apparatus and method to achieve continuous interface and ultrathin film during atomic layer deposition | Thomas E. Seidel, Carl Galewski | 2003-10-28 |
| 6630401 | Radical-assisted sequential CVD | — | 2003-10-07 |
| 6617173 | Integration of ferromagnetic films with ultrathin insulating film using atomic layer deposition | — | 2003-09-09 |
| 6602784 | Radical-assisted sequential CVD | — | 2003-08-05 |
| 6551399 | Fully integrated process for MIM capacitors using atomic layer deposition | Thomas E. Seidel | 2003-04-22 |