Issued Patents All Time
Showing 25 most recent of 108 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12203171 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Jay D. Pinson, II, Jang-Gyoo Yang, Nitin K. Ingle, Qiwei Liang | 2025-01-21 |
| 12146219 | Flow control features of CVD chambers | Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more | 2024-11-19 |
| 12009228 | Low temperature chuck for plasma processing systems | Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky, Satoru Kobayashi, Tae Seung Cho +2 more | 2024-06-11 |
| 11967524 | 3D NAND gate stack reinforcement | Praket P. Jha, Shuchi Sunil Ojha, Jingmei Liang, Abhijit Basu Mallick | 2024-04-23 |
| 11594428 | Low temperature chuck for plasma processing systems | Toan Q. Tran, Zilu Weng, Dmitry Lubomirsky, Satoru Kobayashi, Tae Seung Cho +2 more | 2023-02-28 |
| 11408075 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Jay D. Pinson, II, Jang-Gyoo Yang, Nitin K. Ingle, Qiwei Liang | 2022-08-09 |
| 11264213 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park +4 more | 2022-03-01 |
| 11024486 | Semiconductor processing systems having multiple plasma configurations | Dmitry Lubomirsky, Xinglong Chen | 2021-06-01 |
| 10550472 | Flow control features of CVD chambers | Kien N. Chuc, Qiwei Liang, Hanh Nguyen, Xinglong Chen, Matthew L. Miller +5 more | 2020-02-04 |
| 10468285 | High temperature chuck for plasma processing systems | Toan Q. Tran, Sultan Malik, Dmitry Lubomirsky, Shambhu N. Roy, Satoru Kobayashi +2 more | 2019-11-05 |
| 10424485 | Enhanced etching processes using remote plasma sources | Nitin K. Ingle, Dmitry Lubomirsky, Xinglong Chen | 2019-09-24 |
| 10354843 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park +4 more | 2019-07-16 |
| 10319649 | Optical emission spectroscopy (OES) for remote plasma monitoring | Tae Seung Cho, Soonam Park, Junghoon Kim, Dmitry Lubomirsky | 2019-06-11 |
| 10283321 | Semiconductor processing system and methods using capacitively coupled plasma | Jang-Gyoo Yang, Matthew L. Miller, Xinglong Chen, Kien N. Chuc, Qiwei Liang +1 more | 2019-05-07 |
| 10256079 | Semiconductor processing systems having multiple plasma configurations | Dmitry Lubomirsky, Xinglong Chen | 2019-04-09 |
| 10170282 | Insulated semiconductor faceplate designs | Xinglong Chen, Dmitry Lubomirsky | 2019-01-01 |
| 10113236 | Batch curing chamber with gas distribution and individual pumping | Adib Khan, Jay D. Pinson, II, Jang-Gyoo Yang, Nitin K. Ingle, Qiwei Liang | 2018-10-30 |
| 10032606 | Semiconductor processing with DC assisted RF power for improved control | Jang-Gyoo Yang, Xinglong Chen, Soonam Park, Jonghoon Baek, Saurabh Garg | 2018-07-24 |
| 9991134 | Processing systems and methods for halide scavenging | Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen +5 more | 2018-06-05 |
| 9978564 | Chemical control features in wafer process equipment | Qiwei Liang, Xinglong Chen, Kien N. Chuc, Dmitry Lubomirsky, Soonam Park +4 more | 2018-05-22 |
| 9773695 | Integrated bit-line airgap formation and gate stack post clean | Vinod R. Purayath, Randhir P. S. Thakur, Nitin K. Ingle | 2017-09-26 |
| 9728437 | High temperature chuck for plasma processing systems | Toan Q. Tran, Sultan Malik, Dmitry Lubomirsky, Shambhu N. Roy, Satoru Kobayashi +2 more | 2017-08-08 |
| 9704723 | Processing systems and methods for halide scavenging | Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen +5 more | 2017-07-11 |
| 9659792 | Processing systems and methods for halide scavenging | Anchuan Wang, Xinglong Chen, Zihui Li, Hiroshi Hamana, Zhijun Chen +5 more | 2017-05-23 |
| 9496167 | Integrated bit-line airgap formation and gate stack post clean | Vinod R. Purayath, Randhir P. S. Thakur, Nitin K. Ingle | 2016-11-15 |