Issued Patents All Time
Showing 25 most recent of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12300554 | Systems and methods for analyzing defects in CVD films | Mandar B. Pandit, Man-Ping Cai, Wenhui Li, Michael Wenyoung Tsiang, Jingmin Leng | 2025-05-13 |
| 12230499 | Methods of post treating silicon nitride based dielectric films with high energy low dose plasma | Yong Sun, Jung Chan Lee, Shuchi Sunil Ojha, Jingmei Liang | 2025-02-18 |
| 12094709 | Plasma treatment process to densify oxide layers | Jung Chan Lee, Mun Kyu Park, Jun Seok Lee, Euhngi Lee, Kyu-Ha Shim +5 more | 2024-09-17 |
| 11967524 | 3D NAND gate stack reinforcement | Shuchi Sunil Ojha, Jingmei Liang, Abhijit Basu Mallick, Shankar Venkataraman | 2024-04-23 |
| 11804372 | CD dependent gap fill and conformal films | Jung Chan Lee, Jingmei Liang, Jinrui GUO, Wenhui Li | 2023-10-31 |
| 11699623 | Systems and methods for analyzing defects in CVD films | Mandar B. Pandit, Man-Ping Cai, Wenhui Li, Michael Wenyoung Tsiang, Jingmin Leng | 2023-07-11 |
| 11615966 | Flowable film formation and treatments | Shishi Jiang, Abhijit Basu Mallick | 2023-03-28 |
| 11508611 | Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films | Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Krishna Nittala | 2022-11-22 |
| 11469100 | Methods of post treating dielectric films with microwave radiation | Yong Sun, Jingmei Liang, Martin Jay Seamons, Dongqing Li, Shashank Sharma +2 more | 2022-10-11 |
| 11365476 | Plasma enhanced chemical vapor deposition of films for improved vertical etch performance in 3D NAND memory devices | Allen Ko, Xinhai Han, Thomas Jongwan Kwon, Bok Hoen Kim, Byung Ho Kil +2 more | 2022-06-21 |
| 11367614 | Surface roughness for flowable CVD film | Jinrui GUO, Jingmei Liang, Li Zhang | 2022-06-21 |
| 11170990 | Polysilicon liners | Krishna Nittala, Rui Cheng, Karthik Janakiraman, Jinrui GUO, Jingmei Liang | 2021-11-09 |
| 11170994 | CD dependent gap fill and conformal films | Jung Chan Lee, Jingmei Liang, Jinrui GUO, Wenhui Li | 2021-11-09 |
| 11152248 | Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions | Jingmei Liang, Yong Sun, Jinrui GUO, Jung Chan Lee, Tza-Jing Gung +1 more | 2021-10-19 |
| 11107674 | Methods for depositing silicon nitride | Lakmal C. Kalutarage, Mark Saly, Jingmei Liang | 2021-08-31 |
| 11060189 | Method to enable high temperature processing without chamber drifting | Michael Wenyoung Tsiang, Deenesh Padhi | 2021-07-13 |
| 11011371 | SiBN film for conformal hermetic dielectric encapsulation without direct RF exposure to underlying structure material | Milind Gadre, Shaunak Mukherjee, Deenesh Padhi, Ziqing Duan, Abhijit Basu Mallick | 2021-05-18 |
| 10707116 | Cyclic flowable deposition and high-density plasma treatment processes for high quality gap fill solutions | Jingmei Liang, Yong Sun, Jinrui GUO, Jung Chan Lee, Tza-Jing Gung +1 more | 2020-07-07 |
| 10612135 | Method and system for high temperature clean | Sanjeev Baluja, Kalyanjit Ghosh, Ren-Guan Duan, Mayur Govind Kulkarni, Gregory Siu +4 more | 2020-04-07 |
| 10595477 | Oxide with higher utilization and lower cost | Lei Guo, Milind Gadre, Deenesh Padhi, Tza-Jing Gung | 2020-03-24 |
| 10593543 | Method of depositing doped amorphous silicon films with enhanced defect control, reduced substrate sensitivity to in-film defects and bubble-free film growth | Milind Gadre, Deenesh Padhi | 2020-03-17 |
| 10490436 | Enhanced lift pin design to eliminate local thickness non-uniformity in teos oxide films | Kalyanjit Ghosh, Mayur Govind Kulkarni, Sanjeev Baluja, Krishna Nittala | 2019-11-26 |
| 10483282 | VNAND tensile thick TEOS oxide | Michael Wenyoung Tsiang, Xinhai Han, Bok Hoen Kim, Sang Hyuk Kim, Myung Hun Ju +8 more | 2019-11-19 |
| 10410872 | Borane mediated dehydrogenation process from silane and alkylsilane species for spacer and hardmask application | Rui Cheng, Ziqing Duan, Milind Gadre, Abhijit Basu Mallick, Deenesh Padhi | 2019-09-10 |
| 10373822 | Gas flow profile modulated control of overlay in plasma CVD films | Prashant Kumar Kulshreshtha, Sudha Rathi, Saptarshi Basu, Kwangduk Douglas Lee, Martin Jay Seamons +5 more | 2019-08-06 |