Issued Patents All Time
Showing 1–23 of 23 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8192806 | Plasma particle extraction process for PECVD | Sesha Varadarajan, Edward Augustyniak | 2012-06-05 |
| 7501339 | Methods for making dual-damascene dielectric structures | Jay E. Uglow, Nicolas Bright, Dave Hemker, Kenneth P. MacWilliams, Timothy M. Archer | 2009-03-10 |
| 7060605 | Methods for making dual-damascene dielectric structures | Jay E. Uglow, Nicolas Bright, Dave Hemker, Kenneth P. MacWilliams, Timothy M. Archer | 2006-06-13 |
| 6909190 | Dual-damascene dielectric structures | Jay E. Uglow, Nicolas Bright, Dave Hemker, Kenneth P. MacWilliams, Timothy M. Archer | 2005-06-21 |
| 6528153 | Low dielectric constant porous materials having improved mechanical strength | John C. Kelly | 2003-03-04 |
| 6251770 | Dual-damascene dielectric structures and methods for making the same | Jay E. Uglow, Nicolas Bright, Dave Hemker, Kenneth P. MacWilliams, Timothy M. Archer | 2001-06-26 |
| 6225744 | Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil | Jeffrey Tobin, Eliot K. Broadbent, J. Kirkwood H. Rough | 2001-05-01 |
| 6126382 | Apparatus for aligning substrate to chuck in processing chamber | Martin Scales, David A. Pechin, R. Marshall Stowell | 2000-10-03 |
| 5925411 | Gas-based substrate deposition protection | Everhardus P. van de Ven, Eliot K. Broadbent, Barry Chin, Christopher W. Burkhart | 1999-07-20 |
| 5901271 | Process of evaporating a liquid in a cyclone evaporator | Edward J. McInerney, Michael N. Susoeff | 1999-05-04 |
| 5882417 | Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus | Everhardus P. van de Ven, Eliot K. Broadbent, Barry Chin, Christopher W. Burkhart, Lawrence C. Lane +1 more | 1999-03-16 |
| 5843233 | Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus | Everhardus P. van de Ven, Eliot K. Broadbent, Barry Chin, Christopher W. Burkhart, Lawrence C. Lane +1 more | 1998-12-01 |
| 5769951 | Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus | Everhardus P. van de Ven, Eliot K. Broadbent, Barry Chin, Christopher W. Burkhart, Lawrence C. Lane | 1998-06-23 |
| 5653813 | Cyclone evaporator | Edward J. McInerney, Michael N. Susoeff | 1997-08-05 |
| 5620525 | Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate | Everhardus P. van de Ven, Eliot K. Broadbent, Barry Chin, Christopher W. Burkhart | 1997-04-15 |
| 5605599 | Method of generating plasma having high ion density for substrate processing operation | Eliot K. Broadbent, J. Kirkwood H. Rough | 1997-02-25 |
| 5578532 | Wafer surface protection in a gas deposition process | Everhardus P. van de Ven, Eliot K. Broadbent, Barry Chin, Christopher W. Burkhart | 1996-11-26 |
| 5405480 | Induction plasma source | Eliot K. Broadbent, J. Kirkwood H. Rough | 1995-04-11 |
| 5374594 | Gas-based backside protection during substrate processing | Everhardus P. van de Ven, Eliot K. Broadbent, Barry Chin, Christopher W. Burkhart | 1994-12-20 |
| 5346578 | Induction plasma source | Eliot K. Broadbent, Kirkwood Rough | 1994-09-13 |
| 5238499 | Gas-based substrate protection during processing | Everhardus P. van de Ven, Eliot K. Broadbent, Barry Chin, Christopher W. Burkhart | 1993-08-24 |
| 5230741 | Gas-based backside protection during substrate processing | Everhardus P. van de Ven, Eliot K. Broadbent, Barry Chin, Christopher W. Burkhart | 1993-07-27 |
| 4657616 | In-situ CVD chamber cleaner | David W. Benzing, Arthur Boren, Ching Chiang Tang | 1987-04-14 |