Issued Patents All Time
Showing 1–25 of 32 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8883640 | Sequential station tool for wet processing of semiconductor wafers | Evan E. Patton, Theodore Cacouris, Steven T. Mayer | 2014-11-11 |
| 8450210 | Sequential station tool for wet processing of semiconductor wafers | Evan E. Patton, Theodore Cacouris, Steven T. Mayer | 2013-05-28 |
| 8026174 | Sequential station tool for wet processing of semiconductor wafers | Evan E. Patton, Theodore Cacouris, Steven T. Mayer | 2011-09-27 |
| 7189647 | Sequential station tool for wet processing of semiconductor wafers | Evan E. Patton, Theodore Cacouris, Steven T. Mayer | 2007-03-13 |
| 6709565 | Method and apparatus for uniform electropolishing of damascene ic structures by selective agitation | Steven T. Mayer, Robert J. Contolini, John Drewery | 2004-03-23 |
| 6554914 | Passivation of copper in dual damascene metalization | Robert T. Rozbicki, Ronald A. Powell, Erich R. Klawuhn, Michal Danek, Karl B. Levy +2 more | 2003-04-29 |
| 6225744 | Plasma process apparatus for integrated circuit fabrication having dome-shaped induction coil | Jeffrey Tobin, Jeffrey C. Benzing, J. Kirkwood H. Rough | 2001-05-01 |
| 6162344 | Method of electroplating semiconductor wafer using variable currents and mass transfer to obtain uniform plated layer | Jonathan D. Reid, Robert J. Contolini, Edward C. Opocensky, Evan E. Patton | 2000-12-19 |
| 6110346 | Method of electroplating semicoductor wafer using variable currents and mass transfer to obtain uniform plated layer | Jonathan D. Reid, Robert J. Contolini, Edward C. Opocensky, Evan E. Patton | 2000-08-29 |
| 6074544 | Method of electroplating semiconductor wafer using variable currents and mass transfer to obtain uniform plated layer | Jonathan D. Reid, Robert J. Contolini, Edward C. Opocensky, Evan E. Patton | 2000-06-13 |
| 6027631 | Electroplating system with shields for varying thickness profile of deposited layer | — | 2000-02-22 |
| 5925411 | Gas-based substrate deposition protection | Everhardus P. van de Ven, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1999-07-20 |
| 5882417 | Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus | Everhardus P. van de Ven, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart, Lawrence C. Lane +1 more | 1999-03-16 |
| 5843233 | Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus | Everhardus P. van de Ven, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart, Lawrence C. Lane +1 more | 1998-12-01 |
| 5769951 | Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus | Everhardus P. van de Ven, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart, Lawrence C. Lane | 1998-06-23 |
| 5679405 | Method for preventing substrate backside deposition during a chemical vapor deposition operation | Michael E. Thomas, Everhardus P. van de Van | 1997-10-21 |
| 5620525 | Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate | Everhardus P. van de Ven, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1997-04-15 |
| 5605599 | Method of generating plasma having high ion density for substrate processing operation | Jeffrey C. Benzing, J. Kirkwood H. Rough | 1997-02-25 |
| 5578532 | Wafer surface protection in a gas deposition process | Everhardus P. van de Ven, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1996-11-26 |
| 5405480 | Induction plasma source | Jeffrey C. Benzing, J. Kirkwood H. Rough | 1995-04-11 |
| 5374594 | Gas-based backside protection during substrate processing | Everhardus P. van de Ven, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1994-12-20 |
| 5346578 | Induction plasma source | Jeffrey C. Benzing, Kirkwood Rough | 1994-09-13 |
| 5238499 | Gas-based substrate protection during processing | Everhardus P. van de Ven, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1993-08-24 |
| 5230741 | Gas-based backside protection during substrate processing | Everhardus P. van de Ven, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1993-07-27 |
| 5188717 | Sweeping method and magnet track apparatus for magnetron sputtering | Kenneth C. Miller | 1993-02-23 |