Issued Patents All Time
Showing 1–12 of 12 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5925411 | Gas-based substrate deposition protection | Eliot K. Broadbent, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1999-07-20 |
| 5882417 | Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus | Eliot K. Broadbent, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart, Lawrence C. Lane +1 more | 1999-03-16 |
| 5843233 | Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus | Eliot K. Broadbent, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart, Lawrence C. Lane +1 more | 1998-12-01 |
| 5769951 | Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus | Eliot K. Broadbent, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart, Lawrence C. Lane | 1998-06-23 |
| 5620525 | Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate | Eliot K. Broadbent, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1997-04-15 |
| 5578532 | Wafer surface protection in a gas deposition process | Eliot K. Broadbent, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1996-11-26 |
| 5374594 | Gas-based backside protection during substrate processing | Eliot K. Broadbent, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1994-12-20 |
| 5238499 | Gas-based substrate protection during processing | Eliot K. Broadbent, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1993-08-24 |
| 5230741 | Gas-based backside protection during substrate processing | Eliot K. Broadbent, Jeffrey C. Benzing, Barry Chin, Christopher W. Burkhart | 1993-07-27 |
| 4566177 | Formation of electromigration resistant aluminum alloy conductors | Janet M. Towner | 1986-01-28 |
| 4476483 | Semiconductor device having a doped amorphous silicon adhesive layer | Antonius J. M. Uijen | 1984-10-09 |
| 4374698 | Method of manufacturing a semiconductor device | Jozef A. M. Sanders, Franciscus H. M. Sanders, Hendrikus Kalter | 1983-02-22 |