| 12243725 |
High temperature RF connection with integral thermal choke |
Timothy Scott Thomas, Joel Hollingsworth, David French, Damien Slevin |
2025-03-04 |
|
| 12217939 |
RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks |
David French, Karl Leeser, Liang Meng |
2025-02-04 |
|
| 11990360 |
Electrostatic chuck (ESC) pedestal voltage isolation |
Miguel Benjamin Vasquez |
2024-05-21 |
$220,329,000 |
| 11835868 |
Protective coating for electrostatic chucks |
Stephen Topping |
2023-12-05 |
$84,518,000 |
| 11232966 |
Electrostatic chucking pedestal with substrate backside purging and thermal sinking |
Timothy Scott Thomas, Patrick Breiling, Ramesh Chandrasekharan |
2022-01-25 |
$320,568,000 |
| 11183368 |
RF tuning systems including tuning circuits having impedances for setting and adjusting parameters of electrodes in electrostatic chucks |
David French, Karl Leeser, Liang Meng |
2021-11-23 |
$127,641,000 |
| 11086233 |
Protective coating for electrostatic chucks |
Stephen Topping |
2021-08-10 |
$172,238,000 |
| 10832936 |
Substrate support with increasing areal density and corresponding method of fabricating |
Peter J. Woytowitz, Michael Rumer, Karl Leeser |
2020-11-10 |
$83,083,000 |
| 9447499 |
Dual plenum, axi-symmetric showerhead with edge-to-center gas delivery |
Shambhu N. Roy, Natan Solomon, Sanjay Gopinath, Kaihan Ashtiani, Bart van Schravendijk +3 more |
2016-09-20 |
|
| 9337067 |
High temperature electrostatic chuck with radial thermal chokes |
Shambhu N. Roy, Scott Fields |
2016-05-10 |
|
| 8685215 |
Mechanism for continuously varying radial position of a magnetron |
Keith A. Miller, Anantha K. Subramani, Maurice E. Ewert, Tza-Jing Gung, Hong Yang |
2014-04-01 |
$41,394,000 |
| 7736473 |
Magnetron having continuously variable radial position |
Keith A. Miller, Anantha K. Subramani, Maurice E. Ewert, Tza-Jing Gung, Hong Yang |
2010-06-15 |
$8,018,000 |
| 7138039 |
Liquid isolation of contact rings |
Harald Herchen, Joseph Yahalom |
2006-11-21 |
$24,429,000 |
| 7067045 |
Method and apparatus for sealing electrical contacts during an electrochemical deposition process |
Arthur Keigler, Harald Herchen, Son Trinh |
2006-06-27 |
$13,196,000 |
| 7018515 |
Selectable dual position magnetron |
Tza-Jing Gung, Hong Yang, Anantha K. Subramani, Maurice E. Ewert, Keith A. Miller |
2006-03-28 |
$21,502,000 |
| 6869516 |
Method for removing electrolyte from electrical contacts and wafer touching areas |
Dmitry Lubomirsky, Michael Yang, Girish Dixit, Allen L. D'Ambra, Yeuk-Fai Edwin Mok +1 more |
2005-03-22 |
$21,686,000 |
| 6855235 |
Anode impedance control through electrolyte flow control |
Harald Herchen, Craig Brodeur, Quinwei Wu, Peter Kimball |
2005-02-15 |
$24,638,000 |
| 6843897 |
Anode slime reduction method while maintaining low current |
Harald Herchen |
2005-01-18 |
$25,041,000 |
| 6488820 |
Method and apparatus for reducing migration of conductive material on a component |
— |
2002-12-03 |
$24,582,000 |
| 6469283 |
Method and apparatus for reducing thermal gradients within a substrate support |
Steven V. Sansoni, Michael Sugarman, Anthony Chih-Tung Chan |
2002-10-22 |
$32,970,000 |
| 6377060 |
Method and apparatus for wafer detection |
Deepak Manaoharlal |
2002-04-23 |
$30,581,000 |
| 6303879 |
Laminated ceramic with multilayer electrodes and method of fabrication |
— |
2001-10-16 |
$34,819,000 |
| 6291777 |
Conductive feed-through for creating a surface electrode connection within a dielectric body and method of fabricating same |
Michael Sugarman |
2001-09-18 |
$35,381,000 |
| 6075375 |
Apparatus for wafer detection |
Deepak Manaoharlal |
2000-06-13 |
$124,024,000 |
| D425919 |
Electrostatic chuck with improved spacing mask and workpiece detection device |
Allen Flanigan, Steven V. Sansoni |
2000-05-30 |
|
