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Plasma activated conformal dielectric film deposition |
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Flowable oxide film with tunable wet etch rate |
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Method for depositing a chlorine-free conformal sin film |
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Plasma activated conformal dielectric film deposition |
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Flowable oxide film with tunable wet etch rate |
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Premetal dielectric integration process |
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Method for depositing a chlorine-free conformal sin film |
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2013-11-26 |