Issued Patents All Time
Showing 25 most recent of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12325909 | EM source for enhanced plasma control | Alexander Jansen, Prashanth Kothnur, Martin Lee Riker, David Gunther, Emily Schooley | 2025-06-10 |
| 12264449 | Coupler | Gary Miller, Gavin Urwin, Chris Bradley | 2025-04-01 |
| 12176190 | Arc management algorithm of RF generator and match box for CCP plasma chambers | Tiefeng Shi, Gang Fu | 2024-12-24 |
| 12104347 | Coupler | Gary Miller, Gavin Urwin, Chris Bradley, Chris LEWIS, Howard Reay | 2024-10-01 |
| 12094699 | Methods and apparatus for controlling ion fraction in physical vapor deposition processes | Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, William Fruchterman +4 more | 2024-09-17 |
| D1037954 | Self-retained low friction pad | Ilya Lavitsky | 2024-08-06 |
| 12027354 | Cleaning of SIN with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Tza-Jing Gung, Xianmin Tang +4 more | 2024-07-02 |
| 12018361 | Waveform shape factor for pulsed PVD power | Shouyin Zhang | 2024-06-25 |
| 12014906 | High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber | William Johanson, Cheng-Hsiung Tsai, John C. Forster, Mukund Sundararajan | 2024-06-18 |
| D1026054 | Collimator for a physical vapor deposition (PVD) chamber | Martin Lee Riker, Luke Vianney Varkey, Xiangjin Xie, Kishor Kalathiparambil | 2024-05-07 |
| 11915918 | Cleaning of sin with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Tza-Jing Gung, Xianmin Tang +4 more | 2024-02-27 |
| 11898236 | Methods and apparatus for processing a substrate | Zhiyong Wang, Halbert Chong, John C. Forster, Irena H. Wysok, Tiefeng Shi +9 more | 2024-02-13 |
| 11868147 | Optical emission spectroscopy control of gas flow in processing chambers | Philip DiGiacomo, Sunil Kumar Garg, Paul Kiely, Rajat Agrawal | 2024-01-09 |
| D1009816 | Collimator for a physical vapor deposition chamber | Martin Lee Riker, Fuhong Zhang, Luke Vianney Varkey, Kishor Kalathiparambil, Xiangjin Xie | 2024-01-02 |
| 11810770 | Methods and apparatus for controlling ion fraction in physical vapor deposition processes | Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, William Fruchterman +4 more | 2023-11-07 |
| 11692262 | EM source for enhanced plasma control | Alexander Jansen, Prashanth Kothnur, Martin Lee Riker, David Gunther, Emily Schooley | 2023-07-04 |
| 11676801 | Methods and apparatus for processing a substrate | Tiefeng Shi, Gang Fu | 2023-06-13 |
| 11670493 | Isolator ring clamp and physical vapor deposition chamber incorporating same | Ilya Lavitsky | 2023-06-06 |
| 11661651 | Methods and apparatus for passivating a target | Chao Du, Xing CHEN, Jothilingam Ramalingam, Jianxin Lei | 2023-05-30 |
| 11618943 | PVD target having self-retained low friction pads | Ilya Lavitsky | 2023-04-04 |
| 11512387 | Methods and apparatus for passivating a target | Chao Du, Xing CHEN, Jothilingam Ramalingam, Jianxin Lei | 2022-11-29 |
| 11492697 | Apparatus for improved anode-cathode ratio for rf chambers | Kirankumar Neelasandra SAVANDAIAH, Srinivasa Rao YEDLA, Chandrashekar Kenchappa, Martin Lee Riker | 2022-11-08 |
| 11339466 | Heated shield for physical vapor deposition chamber | Ilya Lavitsky, Goichi Yoshidome | 2022-05-24 |
| D941371 | Process shield for a substrate processing chamber | Ilya Lavitsky, Goichi Yoshidome | 2022-01-18 |
| D941372 | Process shield for a substrate processing chamber | Ilya Lavitsky, Goichi Yoshidome | 2022-01-18 |