Issued Patents All Time
Showing 26–50 of 100 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11211230 | Gas flow system | Wei Wang, Alexander ERENSTEIN, John Mazzocco | 2021-12-28 |
| D934315 | Deposition ring for a substrate processing chamber | Ilya Lavitsky, Goichi Yoshidome | 2021-10-26 |
| 11037768 | Methods and apparatus for controlling ion fraction in physical vapor deposition processes | Xiaodong Wang, Joung Joo Lee, Fuhong Zhang, Martin Lee Riker, William Fruchterman +4 more | 2021-06-15 |
| 10998172 | Substrate processing chamber having improved process volume sealing | Ilya Lavitsky, John Mazzocco | 2021-05-04 |
| 10815561 | Method and apparatus for asymmetric selective physical vapor deposition | Joung Joo Lee, Bencherki Mebarki, Xianmin Tang, Sree Rangasai V. Kesapragada, Sudarsan Srinivasan | 2020-10-27 |
| 10727092 | Heated substrate support ring | — | 2020-07-28 |
| 10697057 | Collimator for use in a physical vapor deposition chamber | Goichi Yoshidome, Hamid Tavassoli, Andrew John Tomko | 2020-06-30 |
| 10336347 | Railroad well car with open truss sides | — | 2019-07-02 |
| 10312065 | Physical vapor deposition (PVD) plasma energy control per dynamic magnetron control | Martin Lee Riker, Shreekant Gayaka, Carl Johnson | 2019-06-04 |
| 10283331 | PVD plasma control using a magnet edge lift mechanism | — | 2019-05-07 |
| D825504 | Target profile for a physical vapor deposition chamber target | Fuhong Zhang, William Johanson, Yu Liu, Adolph Miller Allen, Brij Datta | 2018-08-14 |
| 9984911 | Electrostatic chuck design for high temperature RF applications | Ryan Edwin Hanson, Manjunatha Koppa, Vijay D. Parkhe, John C. Forster | 2018-05-29 |
| 9957601 | Apparatus for gas injection in a physical vapor deposition chamber | Muhammad M. Rasheed, Kirankumar Neelasandra SAVANDAIAH, Alan A. Ritchie, Isaac Porras | 2018-05-01 |
| 9960021 | Physical vapor deposition (PVD) target having low friction pads | Martin Lee Riker, Uday Pai, William Fruchterman, Muhammad M. Rasheed, Thanh X. Nguyen +1 more | 2018-05-01 |
| 9928997 | Apparatus for PVD dielectric deposition | Thanh X. Nguyen, Ilya Lavitsky, Randy D. Schmieding, Prashanth Kothnur | 2018-03-27 |
| 9848461 | Methods and apparatus for thermally treating a substrate | — | 2017-12-19 |
| D797067 | Target profile for a physical vapor deposition chamber target | Fuhong Zhang, William Johanson, Yu Liu, Adolph Miller Allen, Brij Datta | 2017-09-12 |
| 9689070 | Deposition ring and electrostatic chuck for physical vapor deposition chamber | Muhammad M. Rasheed, Rongjun Wang | 2017-06-27 |
| 9605341 | Physical vapor deposition RF plasma shield deposit control | — | 2017-03-28 |
| 9580795 | Sputter source for use in a semiconductor process chamber | Martin Lee Riker | 2017-02-28 |
| 9564348 | Shutter blade and robot blade with CTE compensation | Ilya Lavitsky | 2017-02-07 |
| 9534286 | PVD target for self-centering process shield | Goichi Yoshidome, Ryan Edwin Hanson, Donny Young, Muhammad M. Rasheed | 2017-01-03 |
| 9476122 | Wafer processing deposition shielding components | Martin Lee Riker, Anantha K. Subramani | 2016-10-25 |
| 9315891 | Methods for processing a substrate using multiple substrate support positions | Joung Joo Lee, William Johanson, Alan A. Ritchie | 2016-04-19 |
| 9303311 | Substrate processing system with mechanically floating target assembly | Donny Young, Alan A. Ritchie, Uday Pai, Muhammad M. Rasheed | 2016-04-05 |