Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10763090 | High pressure RF-DC sputtering and methods to improve film uniformity and step-coverage of this process | Adolph Miller Allen, Lara Hawrylchak, Zhigang Xie, Muhammad M. Rasheed, Rongjun Wang +8 more | 2020-09-01 |
| 9695502 | Process kit with plasma-limiting gap | Alan A. Ritchie | 2017-07-04 |
| 9534286 | PVD target for self-centering process shield | Goichi Yoshidome, Ryan Edwin Hanson, Muhammad M. Rasheed, Keith A. Miller | 2017-01-03 |
| 9404174 | Pinned target design for RF capacitive coupled plasma | Alan A. Ritchie | 2016-08-02 |
| 9340866 | Substrate support with radio frequency (RF) return path | Alan A. Ritchie, Wei Wang, Ananthkrishna Jupudi, Thanh X. Nguyen, Kirankumar Neelasandra SAVANDAIAH | 2016-05-17 |
| 9343274 | Process kit shield for plasma enhanced processing chamber | Muhammad M. Rasheed, Kirankumar Neelasandra SAVANDAIAH, Uday Pai | 2016-05-17 |
| 9303311 | Substrate processing system with mechanically floating target assembly | Alan A. Ritchie, Uday Pai, Muhammad M. Rasheed, Keith A. Miller | 2016-04-05 |
| 9255322 | Substrate processing system having symmetric RF distribution and return paths | Alan A. Ritchie, Muhammad M. Rasheed, Keith A. Miller | 2016-02-09 |
| 9123511 | Process kit for RF physical vapor deposition | Lara Hawrylchak | 2015-09-01 |
| 8795488 | Apparatus for physical vapor deposition having centrally fed RF energy | Muhammad M. Rasheed, Lara Hawrylchak, Michael S. Cox, Kirankumar Neelasandra SAVANDAIAH, Alan A. Ritchie | 2014-08-05 |
| 8790499 | Process kit components for titanium sputtering chamber | Alan A. Ritchie, Ilyoung (Richard) Hong, Kathleen Scheible | 2014-07-29 |
| 8702918 | Apparatus for enabling concentricity of plasma dark space | Alan A. Ritchie, Keith A. Miller, Muhammad M. Rasheed, Steve Sansoni, Uday Pai | 2014-04-22 |
| 8668815 | Process kit for RF physical vapor deposition | Lara Hawrylchak | 2014-03-11 |
| 8647484 | Target for sputtering chamber | Alan A. Ritchie, Ilyoung (Richard) Hong, Kathleen Scheible, Umesh M. Kelkar | 2014-02-11 |
| 8647485 | Process kit shield for plasma enhanced processing chamber | Muhammad M. Rasheed, Kirankumar Neelasandra SAVANDAIAH, Uday Pai | 2014-02-11 |
| 7674360 | Mechanism for varying the spacing between sputter magnetron and target | Ilyoung Richard Hong, Michael Rosenstein, Robert B. Lowrance, Daniel C. Lubben, Michael Miller +3 more | 2010-03-09 |
| 7561015 | Magnet secured in a two part shell | Anthony Vesci, Alan Liu, Joe Sommers, Kevin Hughes | 2009-07-14 |
| 6875927 | High temperature DC chucking and RF biasing cable with high voltage isolation for biasable electrostatic chuck applications | Karl M. Brown, Cheng-Hsiung Tsai, Vineet Haresh Mehta, David H. Loo | 2005-04-05 |