Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12203163 | Methods for shaping magnetic fields during semiconductor processing | Suhas Bangalore Umesh, Sushil Arun Samant, Martin Lee Riker, Wei Lei, Kishor Kalathiparambil +4 more | 2025-01-21 |
| 12136544 | Etch uniformity improvement for single turn internal coil PVD chamber | Anthony Chih-Tung Chan, Adolph Miller Allen, Mehul Chauhan | 2024-11-05 |
| 12027352 | Apparatus for generating magnetic fields on substrates during semiconductor processing | Suhas Bangalore Umesh, Kishor Kalathiparambil | 2024-07-02 |
| 11658016 | Shield for a substrate processing chamber | Kathleen Scheible, Michael Allen Flanigan, Adolph Miller Allen, Cristopher M. Pavloff | 2023-05-23 |
| 11569069 | 3D printed chamber components configured for lower film stress and lower operating temperature | Kadthala Ramaya Narendrnath, Govinda Raj, Bopanna Ichettira VASANTHA, Umesh M. Kelkar | 2023-01-31 |
| 11339466 | Heated shield for physical vapor deposition chamber | Ilya Lavitsky, Keith A. Miller | 2022-05-24 |
| D941372 | Process shield for a substrate processing chamber | Ilya Lavitsky, Keith A. Miller | 2022-01-18 |
| D941371 | Process shield for a substrate processing chamber | Ilya Lavitsky, Keith A. Miller | 2022-01-18 |
| D934315 | Deposition ring for a substrate processing chamber | Ilya Lavitsky, Keith A. Miller | 2021-10-26 |
| 10777391 | 3D printed chamber components configured for lower film stress and lower operating temperature | Kadthala Ramaya Narendrnath, Govinda Raj, Bopanna Ichettira VASANTHA, Umesh M. Kelkar | 2020-09-15 |
| 10697057 | Collimator for use in a physical vapor deposition chamber | Keith A. Miller, Hamid Tavassoli, Andrew John Tomko | 2020-06-30 |
| 10563304 | Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambers | Xiangjin Xie, Adolph Miller Allen, Xianmin Tang | 2020-02-18 |
| 10347475 | Holding assembly for substrate processing chamber | Kathleen Scheible, Michael Allen Flanigan, Adolph Miller Allen, Christopher Pavloff | 2019-07-09 |
| 9831075 | Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes | Fuhong Zhang | 2017-11-28 |
| 9644262 | Self-centering process shield | Ryan Edwin Hanson, Nelson Yee | 2017-05-09 |
| 9534286 | PVD target for self-centering process shield | Ryan Edwin Hanson, Donny Young, Muhammad M. Rasheed, Keith A. Miller | 2017-01-03 |
| 9472443 | Selectively groundable cover ring for substrate process chambers | Muhammad M. Rasheed, Kirankumar Neelasandra SAVANDAIAH, William Johanson, Zhenbin Ge | 2016-10-18 |
| 9127362 | Process kit and target for substrate processing chamber | Kathleen Scheible, Michael Allen Flanigan, Adolph Miller Allen, Cristopher M. Pavloff | 2015-09-08 |
| 9096927 | Cooling ring for physical vapor deposition chamber target | Brian T. West, Ralf Hofmann | 2015-08-04 |
| 8500963 | Sputtering of thermally resistive materials including metal chalcogenides | Mengqi Ye, Keith A. Miller, Peijun Ding, Rong Tao | 2013-08-06 |
| 7674360 | Mechanism for varying the spacing between sputter magnetron and target | Ilyoung Richard Hong, Donny Young, Michael Rosenstein, Robert B. Lowrance, Daniel C. Lubben +3 more | 2010-03-09 |