Issued Patents All Time
Showing 25 most recent of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12326282 | Cooling flow in substrate processing according to predicted cooling parameters | Ala Moradian, Orlando Trejo, Elizabeth Neville, Karthik Ramanathan | 2025-06-10 |
| 12228905 | Eco-efficiency monitoring and exploration platform for semiconductor manufacturing | Ala Moradian, Elizabeth Neville, Orlando Trejo, Sergey Meirovich, Kartik Shah +1 more | 2025-02-18 |
| 12001197 | Eco-efficiency (sustainability) dashboard for semiconductor manufacturing | Ala Moradian, Elizabeth Neville, Mark Denome, Prashanth Kothnur, Karthik Ramanathan +3 more | 2024-06-04 |
| 11830706 | Heated pedestal design for improved heat transfer and temperature uniformity | Venkata Sharat Chandra Parimi, Zubin Huang, Jian Li, Satish Radhakrishnan, Rui Cheng +7 more | 2023-11-28 |
| 11810766 | Protection of aluminum process chamber components | Karthikeyan Balaraman, Sathyanarayana Bindiganavale, Rajasekhar PATIBANDLA, Balamurugan Ramasamy, Kartik Shah +3 more | 2023-11-07 |
| 11768984 | Parameter sensing and computer modeling for gas delivery health monitoring | Ala Moradian, James L'HEUREUX, Shuran Sheng, Rohit Mahakali, Karthik Ramanathan +4 more | 2023-09-26 |
| 11591689 | Method for fabricating chamber parts | Mats Larsson, Kevin A. PAPKE, Chirag Shaileshbhai KHAIRNAR, Rajasekhar PATIBANDLA, Karthikeyan Balaraman +2 more | 2023-02-28 |
| 11569069 | 3D printed chamber components configured for lower film stress and lower operating temperature | Kadthala Ramaya Narendrnath, Govinda Raj, Goichi Yoshidome, Bopanna Ichettira VASANTHA | 2023-01-31 |
| 11421322 | Blocker plate for use in a substrate process chamber | Xiaoxiong Yuan, Yu Lei, Yi Xu, Kazuya Daito, Pingyan Lei +2 more | 2022-08-23 |
| 11239058 | Protective layers for processing chamber components | Karthikeyan Balaraman, Balamurugan Ramasamy, Kartik Shah, Mats Larsson, Kevin A. PAPKE +2 more | 2022-02-01 |
| 10777391 | 3D printed chamber components configured for lower film stress and lower operating temperature | Kadthala Ramaya Narendrnath, Govinda Raj, Goichi Yoshidome, Bopanna Ichettira VASANTHA | 2020-09-15 |
| 10626500 | Showerhead design | Kartik Shah, Chaitanya A. PRASAD, Kevin Joseph Bautista, Jeffrey Tobin, Lara Hawrylchak | 2020-04-21 |
| 10508339 | Blocker plate for use in a substrate process chamber | Xiaoxiong Yuan, Yu Lei, Yi Xu, Kazuya Daito, Pingyan Lei +2 more | 2019-12-17 |
| 10221483 | Showerhead design | Kartik Shah, Chaitanya A. PRASAD, Kevin Joseph Bautista, Jeffrey Tobin, Lara Hawrylchak | 2019-03-05 |
| 9863038 | Off-angled heating of the underside of a substrate using a lamp assembly | Maurice E. Ewert, Anantha K. Subramani, Chandrasekhar Balasubramanyam, Joseph M. Ranish | 2018-01-09 |
| 9818587 | Off-angled heating of the underside of a substrate using a lamp assembly | Maurice E. Ewert, Anantha K. Subramani, Chandrasekhar Balasubramanyam, Joseph M. Ranish | 2017-11-14 |
| 9520267 | Bias voltage frequency controlled angular ion distribution in plasma processing | Ludovic Godet, Jun Xue, Prashanth Kothnur, Matthew D. Scotney-Castle | 2016-12-13 |
| 9123758 | Gas injection apparatus and substrate process chamber incorporating same | Agus Sofian Tjandra, Kalyanjit Ghosh, Christopher S. Olsen | 2015-09-01 |
| 9062372 | Self-ionized and capacitively-coupled plasma for sputtering and resputtering | Praburam Gopalraja, Jianming Fu, Xianmin Tang, John C. Forster | 2015-06-23 |
| 8647484 | Target for sputtering chamber | Alan A. Ritchie, Donny Young, Ilyoung (Richard) Hong, Kathleen Scheible | 2014-02-11 |
| 8404048 | Off-angled heating of the underside of a substrate using a lamp assembly | Maurice E. Ewert, Anantha K. Subramani, Chandrasekhar Balasubramanyam, Joseph M. Ranish | 2013-03-26 |
| 7504006 | Self-ionized and capacitively-coupled plasma for sputtering and resputtering | Praburam Gopalraja, Jianming Fu, Xianmin Tang, John C. Forster | 2009-03-17 |
| 6790326 | Magnetron for a vault shaped sputtering target having two opposed sidewall magnets | Anantha K. Subramani, Jianming Fu, Praburam Gopalraja | 2004-09-14 |
| 6406599 | Magnetron with a rotating center magnet for a vault shaped sputtering target | Anantha K. Subramani, Jianming Fu, Praburam Gopalraja | 2002-06-18 |
| 6350320 | Heater for processing chamber | Semyon Sherstinsky, Alison Gilliam, Paul Smith, Leonel A. Zuniga, Ted G. Yoshidome +4 more | 2002-02-26 |