JL

James L'HEUREUX

Applied Materials: 9 patents #1,414 of 7,310Top 20%
Overall (All Time): #530,434 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12203828 Method and system for detecting anomalies in a semiconductor processing system Ryan T. DOWNEY, Hemant P. Mungekar, Andreas Neuber, Michael W. Johnson, Joseph A. VAN GOMPEL +5 more 2025-01-21
11768984 Parameter sensing and computer modeling for gas delivery health monitoring Ala Moradian, Shuran Sheng, Rohit Mahakali, Karthik Ramanathan, Lin Zhang +4 more 2023-09-26
11551917 Reduction of Br2 and Cl2 in semiconductor processes Joseph A. VAN GOMPEL 2023-01-10
10889891 Apparatus for gaseous byproduct abatement and foreline cleaning 2021-01-12
10861681 Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent Ryan T. DOWNEY, David Muquing HOU, Yan Rozenzon 2020-12-08
10757797 Method and apparatus for gas abatement Rongping Wang, Jibing Zeng, David Muquing HOU, Michael S. Cox, Zheng Yuan 2020-08-25
10435787 Hydrogen partial pressure control in a vacuum process chamber Hari Ponnekanti 2019-10-08
10187966 Method and apparatus for gas abatement Rongping Wang, Jibing Zeng, David Muquing HOU, Michael S. Cox, Zheng Yuan 2019-01-22
9022715 Load lock chamber designs for high-throughput processing system Alexander S. Polyak, Christopher T. Lane, Susanne Schlaefer, Juergen Henrich, Josef T. Hoog +1 more 2015-05-05