KS

Kirankumar Neelasandra SAVANDAIAH

Applied Materials: 75 patents #76 of 7,310Top 2%
Overall (All Time): #24,616 of 4,157,543Top 1%
76
Patents All Time

Issued Patents All Time

Showing 25 most recent of 76 patents

Patent #TitleCo-InventorsDate
12381101 Semiconductor process equipment Bhaskar PRASAD, Thomas Brezoczky, Lakshmikanth Krishnamurthy SHIRAHATTI 2025-08-05
12368028 Apparatus for improved high pressure plasma processing William Johanson, Cory Eugene Lafollett 2025-07-22
12347719 Floating pin for substrate transfer Sreenath SOVENAHALLI, Bhaskar PRASAD, Srinivasa Rao YEDLA, Thomas Brezoczky 2025-07-01
12338527 Shutter disk for physical vapor deposition (PVD) chamber Zhiyong Wang, Halbert Chong, Irena H. Wysok, Jianxin Lei, Rongjun Wang +2 more 2025-06-24
D1072774 Target profile for a physical vapor deposition chamber target Shane Lavan, Madan Kumar Shimoga Mylarappa, Sundarapandian Ramalinga Vijayalakshmi REDDY, Avinash NAYAK, Wei Dou +2 more 2025-04-29
12266551 Apparatus, system, and method for non-contact temperature monitoring of substrate supports Bhaskar PRASAD, Thomas Brezoczky, Srinivasa Rao YEDLA 2025-04-01
12217982 Isolated volume seals and method of forming an isolated volume within a processing chamber Nitin Bharadwaj SATYAVOLU, Srinivasa Rao YEDLA, Bhaskar PRASAD, Thomas Brezoczky 2025-02-04
12195314 Cathode exchange mechanism to improve preventative maintenance time for cluster system Bhaskar PRASAD, Thomas Brezoczky, Srinivasa Rao YEDLA 2025-01-14
12183560 Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process Shane Lavan, Sundarapandian Ramalinga Vijayalakshmi REDDY, Randal Dean Schmieding, Yong Cao 2024-12-31
12100614 Apparatus for controlling lift pin movement Anubhav Srivastava, Bhaskar PRASAD, Thomas Brezoczky, Nitin Bharadwaj SATYAVOLU 2024-09-24
12080571 Substrate processing module and method of moving a workpiece Srinivasa Rao YEDLA, Thomas Brezoczky 2024-09-03
D1040304 Deposition ring for physical vapor deposition chamber David Gunther, Cheng-Hsiung Tsai 2024-08-27
12043896 Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure Srinivasa Rao YEDLA, Nitin Bharadwaj SATYAVOLU, Ganesh Subbuswamy, Devi Raghavee Veerappan, Thomas Brezoczky 2024-07-23
12027354 Cleaning of SIN with CCP plasma or RPS clean Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more 2024-07-02
12002668 Thermal management hardware for uniform temperature control for enhanced bake-out for cluster tool Srinivasa Rao YEDLA, Thomas Brezoczky, Hari Prasath Rajendran 2024-06-04
11961723 Process kit having tall deposition ring for PVD chamber David Gunther, Cheng-Hsiung Tsai 2024-04-16
11955355 Isolated volume seals and method of forming an isolated volume within a processing chamber Nitin Bharadwaj SATYAVOLU, Srinivasa Rao YEDLA, Bhaskar PRASAD, Thomas Brezoczky 2024-04-09
11935732 Process kit geometry for particle reduction in PVD processes Adolph Miller Allen, Randal Dean Schmieding, Vanessa Faune 2024-03-19
11915918 Cleaning of sin with CCP plasma or RPS clean Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more 2024-02-27
11898236 Methods and apparatus for processing a substrate Zhiyong Wang, Halbert Chong, John C. Forster, Irena H. Wysok, Tiefeng Shi +9 more 2024-02-13
11846013 Methods and apparatus for extended chamber for through silicon via deposition David Gunther, Jiao Song, Irena H. Wysok, Anthony Chih-Tung Chan 2023-12-19
D1007449 Target profile for a physical vapor deposition chamber target David Gunther, Jiao Song, Madan Kumar Shimoga Mylarappa, Yue Cui, Nuno Yen-Chu Chen +1 more 2023-12-12
11817331 Substrate holder replacement with protective disk during pasting process Srinivasa Rao YEDLA, Thomas Brezoczky, Bhaskar PRASAD, Nitin Bharadwaj SATYAVOLU 2023-11-14
11749542 Apparatus, system, and method for non-contact temperature monitoring of substrate supports Bhaskar PRASAD, Thomas Brezoczky, Srinivasa Rao YEDLA 2023-09-05
11674227 Symmetric pump down mini-volume with laminar flow cavity gas injection for high and low pressure Srinivasa Rao YEDLA, Nitin Bharadwaj SATYAVOLU, Ganesh Subbuswamy, Devi Raghavee Veerappan, Thomas Brezoczky 2023-06-13