SL

Shane Lavan

Applied Materials: 15 patents #903 of 7,310Top 15%
Overall (All Time): #307,569 of 4,157,543Top 8%
15
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
D1072774 Target profile for a physical vapor deposition chamber target Madan Kumar Shimoga Mylarappa, Sundarapandian Ramalinga Vijayalakshmi REDDY, Avinash NAYAK, Wei Dou, Yong Cao +2 more 2025-04-29
12185643 High critical temperature metal nitride layer with oxide or oxynitride seed layer Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more 2024-12-31
12183560 Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process Kirankumar Neelasandra SAVANDAIAH, Sundarapandian Ramalinga Vijayalakshmi REDDY, Randal Dean Schmieding, Yong Cao 2024-12-31
12176205 Method and chamber for backside physical vapor deposition Chunming Zhou, Jothilingam Ramalingam, Yong Cao, Kevin Moraes 2024-12-24
12142478 Method and chamber for backside physical vapor deposition Chunming Zhou, Jothilingam Ramalingam, Yong Cao, Kevin Moraes 2024-11-12
12096701 Method of making high critical temperature metal nitride layer Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more 2024-09-17
12052935 Method of making high critical temperature metal nitride layer Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more 2024-07-30
12027354 Cleaning of SIN with CCP plasma or RPS clean Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more 2024-07-02
11915918 Cleaning of sin with CCP plasma or RPS clean Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more 2024-02-27
11678589 Method of making high critical temperature metal nitride layer Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more 2023-06-13
11600477 Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process Kirankumar Neelasandra SAVANDAIAH, Sundarapandian Ramalinga Vijayalakshmi REDDY, Randal Dean Schmieding, Yong Cao 2023-03-07
11600761 High critical temperature metal nitride layer with oxide or oxynitride seed layer Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more 2023-03-07
11572618 Method and chamber for backside physical vapor deposition Jothilingam Ramalingam, Xiaozhou Che, Yong Cao, Chunming Zhou 2023-02-07
11469096 Method and chamber for backside physical vapor deposition Chunming Zhou, Jothilingam Ramalingam, Yong Cao, Kevin Moraes 2022-10-11
11450514 Methods of reducing particles in a physical vapor deposition (PVD) chamber Wei Dou, Yong Cao, Mingdong Li, Jothilingam Ramalingam, Chengyu Liu 2022-09-20