Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| D1072774 | Target profile for a physical vapor deposition chamber target | Madan Kumar Shimoga Mylarappa, Sundarapandian Ramalinga Vijayalakshmi REDDY, Avinash NAYAK, Wei Dou, Yong Cao +2 more | 2025-04-29 |
| 12185643 | High critical temperature metal nitride layer with oxide or oxynitride seed layer | Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more | 2024-12-31 |
| 12183560 | Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process | Kirankumar Neelasandra SAVANDAIAH, Sundarapandian Ramalinga Vijayalakshmi REDDY, Randal Dean Schmieding, Yong Cao | 2024-12-31 |
| 12176205 | Method and chamber for backside physical vapor deposition | Chunming Zhou, Jothilingam Ramalingam, Yong Cao, Kevin Moraes | 2024-12-24 |
| 12142478 | Method and chamber for backside physical vapor deposition | Chunming Zhou, Jothilingam Ramalingam, Yong Cao, Kevin Moraes | 2024-11-12 |
| 12096701 | Method of making high critical temperature metal nitride layer | Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more | 2024-09-17 |
| 12052935 | Method of making high critical temperature metal nitride layer | Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more | 2024-07-30 |
| 12027354 | Cleaning of SIN with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more | 2024-07-02 |
| 11915918 | Cleaning of sin with CCP plasma or RPS clean | Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more | 2024-02-27 |
| 11678589 | Method of making high critical temperature metal nitride layer | Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more | 2023-06-13 |
| 11600477 | Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process | Kirankumar Neelasandra SAVANDAIAH, Sundarapandian Ramalinga Vijayalakshmi REDDY, Randal Dean Schmieding, Yong Cao | 2023-03-07 |
| 11600761 | High critical temperature metal nitride layer with oxide or oxynitride seed layer | Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more | 2023-03-07 |
| 11572618 | Method and chamber for backside physical vapor deposition | Jothilingam Ramalingam, Xiaozhou Che, Yong Cao, Chunming Zhou | 2023-02-07 |
| 11469096 | Method and chamber for backside physical vapor deposition | Chunming Zhou, Jothilingam Ramalingam, Yong Cao, Kevin Moraes | 2022-10-11 |
| 11450514 | Methods of reducing particles in a physical vapor deposition (PVD) chamber | Wei Dou, Yong Cao, Mingdong Li, Jothilingam Ramalingam, Chengyu Liu | 2022-09-20 |