| D1072774 |
Target profile for a physical vapor deposition chamber target |
Madan Kumar Shimoga Mylarappa, Sundarapandian Ramalinga Vijayalakshmi REDDY, Avinash NAYAK, Wei Dou, Yong Cao +2 more |
2025-04-29 |
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| 12183560 |
Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process |
Kirankumar Neelasandra SAVANDAIAH, Sundarapandian Ramalinga Vijayalakshmi REDDY, Randal Dean Schmieding, Yong Cao |
2024-12-31 |
$49,330,000 |
| 12185643 |
High critical temperature metal nitride layer with oxide or oxynitride seed layer |
Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more |
2024-12-31 |
$49,330,000 |
| 12176205 |
Method and chamber for backside physical vapor deposition |
Chunming Zhou, Jothilingam Ramalingam, Yong Cao, Kevin Moraes |
2024-12-24 |
$95,614,000 |
| 12142478 |
Method and chamber for backside physical vapor deposition |
Chunming Zhou, Jothilingam Ramalingam, Yong Cao, Kevin Moraes |
2024-11-12 |
$39,712,000 |
| 12096701 |
Method of making high critical temperature metal nitride layer |
Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more |
2024-09-17 |
$46,375,000 |
| 12052935 |
Method of making high critical temperature metal nitride layer |
Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more |
2024-07-30 |
$79,851,000 |
| 12027354 |
Cleaning of SIN with CCP plasma or RPS clean |
Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more |
2024-07-02 |
$85,126,000 |
| 11915918 |
Cleaning of sin with CCP plasma or RPS clean |
Jothilingam Ramalingam, Yong Cao, Ilya Lavitsky, Keith A. Miller, Tza-Jing Gung +4 more |
2024-02-27 |
$57,915,000 |
| 11678589 |
Method of making high critical temperature metal nitride layer |
Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more |
2023-06-13 |
$42,513,000 |
| 11600761 |
High critical temperature metal nitride layer with oxide or oxynitride seed layer |
Zihao Yang, Mingwei Zhu, Shriram Mangipudi, Mohammad Kamruzzaman Chowdhury, Zhebo Chen +2 more |
2023-03-07 |
$32,704,000 |
| 11600477 |
Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process |
Kirankumar Neelasandra SAVANDAIAH, Sundarapandian Ramalinga Vijayalakshmi REDDY, Randal Dean Schmieding, Yong Cao |
2023-03-07 |
$32,704,000 |
| 11572618 |
Method and chamber for backside physical vapor deposition |
Jothilingam Ramalingam, Xiaozhou Che, Yong Cao, Chunming Zhou |
2023-02-07 |
$44,390,000 |
| 11469096 |
Method and chamber for backside physical vapor deposition |
Chunming Zhou, Jothilingam Ramalingam, Yong Cao, Kevin Moraes |
2022-10-11 |
$43,708,000 |
| 11450514 |
Methods of reducing particles in a physical vapor deposition (PVD) chamber |
Wei Dou, Yong Cao, Mingdong Li, Jothilingam Ramalingam, Chengyu Liu |
2022-09-20 |
$25,949,000 |
