Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10047430 | Self-ionized and inductively-coupled plasma for sputtering and resputtering | Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more | 2018-08-14 |
| 8696875 | Self-ionized and inductively-coupled plasma for sputtering and resputtering | Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more | 2014-04-15 |
| 8668816 | Self-ionized and inductively-coupled plasma for sputtering and resputtering | Peijun Ding, Rong Tao, Zheng Xu, Daniel C. Lubben, Suraj Rengarajan +7 more | 2014-03-11 |
| 7674360 | Mechanism for varying the spacing between sputter magnetron and target | Ilyoung Richard Hong, Donny Young, Michael Rosenstein, Robert B. Lowrance, Daniel C. Lubben +3 more | 2010-03-09 |
| 7294574 | Sputter deposition and etching of metallization seed layer for overhang and sidewall improvement | Peijun Ding, Fuhong Zhang, Hsien-Lung Yang, Jianming Fu, Jick Yu +2 more | 2007-11-13 |
| 6852202 | Small epicyclic magnetron with controlled radial sputtering profile | James Tsung, Daniel C. Lubben, Ilyoung Richard Hong, Peijun Ding | 2005-02-08 |
| 6627050 | Method and apparatus for depositing a tantalum-containing layer on a substrate | Peijun Ding, Howard H. Tang, Tony P. Chiang, Jianming Fu | 2003-09-30 |