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In situ plasma clean for removal of residue from pedestal surface without breaking vacuum |
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In situ plasma clean for removal of residue from pedestal surface without breaking vacuum |
Richard Green, Cheng-Hsiung Tsai, Shambhu N. Roy, Puneet Bajaj |
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High temperature DC chucking and RF biasing cable with high voltage isolation for biasable electrostatic chuck applications |
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Method and apparatus for optimizing a dechucking period used to dechuck a workpiece from an electrostatic chuck |
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1998-10-06 |