Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › In situ plasma clean for removal of residue from pedestal surface without breaking vacuum

In situ plasma clean for removal of residue from pedestal surface without breaking vacuum

US Patent 8900471 · Granted Dec 2, 2014

Estimated economic value: $13,777,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Substrate support for a substrate processing chamber2025
Substrate position calibration for substrate supports in substrate processing sy2025
Semiconductor structure and method for forming the same2024
Deposition ring for physical vapor deposition chamber2024
Interconnect structure having a barrier layer along the sidewall of self-aligned2024
High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) 2024
Process kit having tall deposition ring for PVD chamber2024
Substrate support for reduced damage substrate backside2024
Methods and apparatus for precleaning and treating wafer surfaces2024
Detachable biasable electrostatic chuck for high temperature applications2024
Spacer etching process for integrated circuit design2023
Circuit and method for controlling switching regulator with ultrasonic mode2023