Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods and apparatus for precleaning and treating wafer surfaces

Methods and apparatus for precleaning and treating wafer surfaces

US Patent 11939666 · Granted Mar 26, 2024

Estimated economic value: $55,219,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Optical imaging lens including seven lenses of −++−+−−, −++−+−+, −++−−−−, −+−−+−2025
Coalescing filter element2025
Directional selective junction clean with field polymer protections2025
Switchable two-stage coalescence separation system2025
Methods and materials for enhanced barrier performance and reduced via resistanc2025
Self-assembled monolayer for selective deposition2025
System for target arcing mapping and plasma diagnosis2025
Methods and apparatus for enhancing selectivity of titanium and titanium silicid2025
Method for constructing digital twin monitoring model for slopes based on proxy 2025
Metal oxide preclean for bottom-up gapfill in MEOL and BEOL2025
Methods for controlling contact resistance in cobalt-titanium structures2025
Methods for controlling contact resistance in cobalt-titanium structures2025