| 12228395 |
Substrate position calibration for substrate supports in substrate processing systems |
Tomoharu Matsushita, Jallepally Ravi, Cheng-Hsiung Tsai, Hiroyuki Takahama |
2025-02-18 |
| 12112890 |
Top magnets for decreased non-uniformity in PVD |
Borui Xia, Anthony Chih-Tung Chan, Shiyu YUE, Wei-Sheng Lei, Mukund Sundararajan +2 more |
2024-10-08 |
| 11939666 |
Methods and apparatus for precleaning and treating wafer surfaces |
Xiangjin Xie, Carmen Leal Cervantes, Feng Chen, Lu Chen, Wenjing Xu +4 more |
2024-03-26 |
| D942516 |
Process shield for a substrate processing chamber |
Manjunatha Koppa, Cheng-Hsiung Tsai, Manjunath H. Venkataswamappa, Steven V. Sansoni, David T. Or |
2022-02-01 |
| 11201078 |
Substrate position calibration for substrate supports in substrate processing systems |
Tomoharu Matsushita, Jallepally Ravi, Cheng-Hsiung Tsai, Hiroyuki Takahama |
2021-12-14 |
| D933725 |
Deposition ring for a substrate processing chamber |
Manjunatha Koppa, Cheng-Hsiung Tsai, Manjunath H. Venkataswamappa, Steven V. Sansoni, David T. Or |
2021-10-19 |
| 10892180 |
Lift pin assembly |
Bonnie T. Chia, Jallepally Ravi, Manjunatha Koppa, Vinod Konda Purathe, Cheng-Hsiung Tsai |
2021-01-12 |
| D891382 |
Process shield for a substrate processing chamber |
Manjunatha Koppa, Cheng-Hsiung Tsai, Manjunath H. Venkataswamappa, Steven V. Sansoni, David T. Or |
2020-07-28 |
| 10134615 |
Substrate support with improved RF return |
Cheng-Hsiung Tsai, Jallepally Ravi, Tomoharu Matsushita, Yu Chang |
2018-11-20 |
| 9888528 |
Substrate support with multiple heating zones |
Tomoharu Matsushita, Jallepally Ravi, Cheng-Hsiung Tsai, Xiaoxiong Yuan, Manjunatha Koppa |
2018-02-06 |
