Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber

High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) for PVD chamber

US Patent 12014906 · Granted Jun 18, 2024

Estimated economic value: $83,264,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Broadband supply circuitry for a plasma processing system2025
Apparatus for improved high pressure plasma processing2025
EM source for enhanced plasma control2025
Substrate support for a substrate processing chamber2025
Coupler2025
Substrate position calibration for substrate supports in substrate processing sy2025
Rating substrate support assemblies based on impedance circuit electron flow usi2025
Arc management algorithm of RF generator and match box for CCP plasma chambers2024
Semiconductor structure and method for forming the same2024
Symmetric plasma source to generate pie-shaped treatment2024
Top magnets for decreased non-uniformity in PVD2024
Coupler2024