Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › EM source for enhanced plasma control

EM source for enhanced plasma control

US Patent 12325909 · Granted Jun 10, 2025

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods for increasing blood flow2025
Process chamber collimator2025
Methods for forming films on substrates2025
Broadband supply circuitry for a plasma processing system2025
Eco-efficiency (sustainability) dashboard for semiconductor manufacturing2025
Apparatus and method for controlling a flow process material to a deposition cha2025
Coupler2025
Methods for shaping magnetic fields during semiconductor processing2025
Methods for shaping magnetic fields during semiconductor processing2025
Methods for copper doped hybrid metallization for line and via2024
Arc management algorithm of RF generator and match box for CCP plasma chambers2024
Virtual measurement of conditions proximate to a substrate with physics-informed2024