Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › High temperature DC chucking and RF biasing cable with high voltage isolation for biasable electrostatic chuck applications

High temperature DC chucking and RF biasing cable with high voltage isolation for biasable electrostatic chuck applications

US Patent 6875927 · Granted Apr 5, 2005

Estimated economic value: $19,530,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Systems and methods for providing a trajectory planning engine for unmanned airc2025
Substrate support for a substrate processing chamber2025
Substrate position calibration for substrate supports in substrate processing sy2025
Apparatus, systems, and method of providing an unmanned and manned air traffic m2025
Semiconductor structure and method for forming the same2024
Deposition ring for physical vapor deposition chamber2024
Interconnect structure having a barrier layer along the sidewall of self-aligned2024
Apparatus, systems, and methods for providing surveillance services for unmanned2024
High temperature detachable very high frequency (VHF) electrostatic chuck (ESC) 2024
Process kit having tall deposition ring for PVD chamber2024
Substrate support for reduced damage substrate backside2024
Methods and apparatus for precleaning and treating wafer surfaces2024