Issued Patents All Time
Showing 26–42 of 42 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7077903 | Etch selectivity enhancement for tunable etch resistant anti-reflective layer | Katherina Babich, Scott D. Halle, David V. Horak, Wesley C. Natzle, Dirk Pfeiffer +1 more | 2006-07-18 |
| 7030008 | Techniques for patterning features in semiconductor devices | Scott D. Allen, Katherina Babich, Steven J. Holmes, Dirk Pfeiffer, Richard Wise | 2006-04-18 |
| 6979518 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Robert N. Lang +1 more | 2005-12-27 |
| 6903023 | In-situ plasma etch for TERA hard mask materials | Richard S. Wise, Sadanand V. Deshpande, Wendy Yan, Soctt D. Allen | 2005-06-07 |
| 6869899 | Lateral-only photoresist trimming for sub-80 nm gate stack | Maheswaran Surendra, Jung Hyuk YOON, Ying Zhang | 2005-03-22 |
| 6869542 | Hard mask integrated etch process for patterning of silicon oxide and other dielectric materials | Sadanand V. Desphande, David M. Dobuzinsky, Tina Wagner, Richard S. Wise | 2005-03-22 |
| 6849389 | Method to prevent pattern collapse in features etched in sulfur dioxide-containing plasmas | — | 2005-02-01 |
| 6780736 | Method for image reversal of implant resist using a single photolithography exposure and structures formed thereby | Steven J. Holmes, Toshiharu Furukawa, Dirk Pfeiffer | 2004-08-24 |
| 6730445 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Robert N. Lang +1 more | 2004-05-04 |
| 6730454 | Antireflective SiO-containing compositions for hardmask layer | Dirk Pfeiffer, Marie Angelopoulos, Katherina Babich, Phillip Brock, Wu-Song Huang +2 more | 2004-05-04 |
| 6682860 | Attenuated embedded phase shift photomask blanks | Marie Angelopoulos, Katherina Babich, S. Jay Chey, Michael S. Hibbs, Robert N. Lang +1 more | 2004-01-27 |
| 6649531 | Process for forming a damascene structure | William J. Cote, Timothy J. Dalton, Prakash Dev, Daniel C. Edelstein, Scott D. Halle +1 more | 2003-11-18 |
| 6586156 | Etch improved resist systems containing acrylate (or methacrylate) silane monomers | Marie Angelopoulos, Wu-Song Huang, Dai Junyan, Ranee W. Kwong, Robert N. Lang +3 more | 2003-07-01 |
| 6514667 | Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof | Marie Angelopoulos, Katherina Babich, Alfred Grill, Scott D. Halle, Vishnubhai V. Patel | 2003-02-04 |
| 6482566 | Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography | Donald C. Hofer, Scott A. MacDonald, Robert D. Miller, Josef Michl, Gregory Michael Wallraff | 2002-11-19 |
| 6420084 | Mask-making using resist having SIO bond-containing polymer | Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong +3 more | 2002-07-16 |
| 6316167 | Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereof | Marie Angelopoulos, Katherina Babich, Alfred Grill, Scott D. Halle, Vishnubhai V. Patel | 2001-11-13 |